Dynamic dispersing technique for PR coating process in planar lightwave circuit fabrication

A new dynamic dispersing technique (DDT) is proposed and demonstrated to improve the photoresist (PR) coating process in planar lightwave circuit (PLC) fabrication. In this technique, the PR is dispensed during the wafer's spin cycle on the spin coaler instead of the conventional static dispens...

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主要な著者: Pua, Chang Hong, Harun, Sulaiman Wadi, Chong, Wu Yi, Jayapalan, Kanesh Kumar, Ahmad, Harith
フォーマット: 論文
出版事項: John Wiley & Sons 2007
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オンライン・アクセス:http://eprints.um.edu.my/19681/
http://dx.doi.org/10.1002/mop.22609
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