Nanoscale patterning by AFM lithography and its application on the fabrication of silicon nanowire devices
Many techniques have been applied to fabricate nanostructures via top-down approach such as electron beam lithography. However, most of the techniques are very complicated and involves many process steps, high cost operation as well as the use of hazardous chemicals. Meanwhile, atomic force microsco...
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| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Universiti Kebangsaan Malaysia
2014
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| Online Access: | http://journalarticle.ukm.my/6857/1/15_Sabar_D._Hutagalung.pdf http://journalarticle.ukm.my/6857/ http://www.ukm.my/jsm |
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