Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite
This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots...
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my-inti-eprints.9802017-11-22T05:26:49Z http://eprints.intimal.edu.my/980/ Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite Low, Andrew Chun Wey Damideh, Vahid* Saw, S. H. Lim, Chin Seong* QC Physics This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots while the second test was carried out using 1 focus shot at 2, 3, 4, 5 and 7 Torr. Both tests were conducted with neon as filling gas at 7 Torr at distance of 8cm from the anode tip. In the first test, FESEM images exhibit a non-homogenous, non-uniformed and largely agglomerated carbon deposition at all films as pressure of filling gas increases. The EDX mapping confirms that carbon content in substrate increases from 10% to 30% as number of shot increases, and there is more carbon content detected in the centre position than the off-centre position. There is also a decrease in carbon content 35% to 25% as pressure of gas increases. Trans Tech Publications 2016 Article PeerReviewed Low, Andrew Chun Wey and Damideh, Vahid* and Saw, S. H. and Lim, Chin Seong* (2016) Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite. Key Engineering Materials, 701. pp. 42-46. ISSN 1662-9795 https://www.scientific.net/KEM.701.42 10.4028/www.scientific.net/KEM.701.42 |
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QC Physics Low, Andrew Chun Wey Damideh, Vahid* Saw, S. H. Lim, Chin Seong* Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
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This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots while the second test was carried out using 1 focus shot at 2, 3, 4, 5 and 7 Torr. Both tests were conducted with neon as filling gas at 7 Torr at distance of 8cm from the anode tip. In the first test, FESEM images exhibit a non-homogenous, non-uniformed and largely agglomerated carbon deposition at all films as pressure of filling gas increases. The EDX mapping confirms that carbon content in substrate increases from 10% to 30% as number of shot increases, and there is more carbon content detected in the centre position than the off-centre position. There is also a decrease in carbon content 35% to 25% as pressure of gas increases. |
format |
Article |
author |
Low, Andrew Chun Wey Damideh, Vahid* Saw, S. H. Lim, Chin Seong* |
author_facet |
Low, Andrew Chun Wey Damideh, Vahid* Saw, S. H. Lim, Chin Seong* |
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Low, Andrew Chun Wey |
title |
Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
title_short |
Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
title_full |
Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
title_fullStr |
Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
title_full_unstemmed |
Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
title_sort |
process development and optimization of carbon-based thin film deposition through ablation of graphite |
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Trans Tech Publications |
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2016 |
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http://eprints.intimal.edu.my/980/ https://www.scientific.net/KEM.701.42 |
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1644541356425609216 |
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13.18916 |