Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite

• Main Authors: Low, Andrew Chun Wey, Damideh, Vahid*, Saw, S. H., Lim, Chin Seong*
• Format: Article
• Published: Trans Tech Publications 2016
• Subjects: QC Physics
• Online Access: http://eprints.intimal.edu.my/980/; https://www.scientific.net/KEM.701.42

This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots while the second test was carried out using 1 focus shot at 2, 3, 4, 5 and 7 Torr. Both tests were conducted with neon as filling gas at 7 Torr at distance of 8cm from the anode tip. In the first test, FESEM images exhibit a non-homogenous, non-uniformed and largely agglomerated carbon deposition at all films as pressure of filling gas increases. The EDX mapping confirms that carbon content in substrate increases from 10% to 30% as number of shot increases, and there is more carbon content detected in the centre position than the off-centre position. There is also a decrease in carbon content 35% to 25% as pressure of gas increases.