Enhancement of nano-RC switching delay due to the resistance blow-up in ingaas

RC and transit-time delays in a nanocircuit, where the resistor is a few nanometers in length, are evaluated taking into account the velocity and current saturation and applied to RC switching delay in InGaAs heterojunction field effect transistor (HFET). Transit time delay is the dominant factor in...

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Main Authors: Ismail, Razali, Tan, Michael L. P., Saad, Ismail
Format: Article
Published: World Scientific Publishing, Singapore 2007
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Online Access:http://eprints.utm.my/id/eprint/8652/
http://dx.doi.org/10.1142/S1793292007000568
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spelling my.utm.86522009-05-06T04:59:28Z http://eprints.utm.my/id/eprint/8652/ Enhancement of nano-RC switching delay due to the resistance blow-up in ingaas Ismail, Razali Tan, Michael L. P. Saad, Ismail TK Electrical engineering. Electronics Nuclear engineering RC and transit-time delays in a nanocircuit, where the resistor is a few nanometers in length, are evaluated taking into account the velocity and current saturation and applied to RC switching delay in InGaAs heterojunction field effect transistor (HFET). Transit time delay is the dominant factor in the ohmic regime where the applied voltage V is less than the critical voltage V-c for the onset of nonlinear nonohmic behavior. However, RC time constant is predominant in the nonohmic regime and increases linearly with the applied step voltage. The power in the nanocircuit is smaller and rises linearly in the nonohmic regime as compared to the quadratic behavior in the ohmic regime. World Scientific Publishing, Singapore 2007-08 Article PeerReviewed Ismail, Razali and Tan, Michael L. P. and Saad, Ismail (2007) Enhancement of nano-RC switching delay due to the resistance blow-up in ingaas. NANO Brief Report and Review, 2 (4). pp. 233-237. ISSN 1793-2920 (Print) ; 1793-7094 (online) http://dx.doi.org/10.1142/S1793292007000568 10.1142/S1793292007000568
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
topic TK Electrical engineering. Electronics Nuclear engineering
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Ismail, Razali
Tan, Michael L. P.
Saad, Ismail
Enhancement of nano-RC switching delay due to the resistance blow-up in ingaas
description RC and transit-time delays in a nanocircuit, where the resistor is a few nanometers in length, are evaluated taking into account the velocity and current saturation and applied to RC switching delay in InGaAs heterojunction field effect transistor (HFET). Transit time delay is the dominant factor in the ohmic regime where the applied voltage V is less than the critical voltage V-c for the onset of nonlinear nonohmic behavior. However, RC time constant is predominant in the nonohmic regime and increases linearly with the applied step voltage. The power in the nanocircuit is smaller and rises linearly in the nonohmic regime as compared to the quadratic behavior in the ohmic regime.
format Article
author Ismail, Razali
Tan, Michael L. P.
Saad, Ismail
author_facet Ismail, Razali
Tan, Michael L. P.
Saad, Ismail
author_sort Ismail, Razali
title Enhancement of nano-RC switching delay due to the resistance blow-up in ingaas
title_short Enhancement of nano-RC switching delay due to the resistance blow-up in ingaas
title_full Enhancement of nano-RC switching delay due to the resistance blow-up in ingaas
title_fullStr Enhancement of nano-RC switching delay due to the resistance blow-up in ingaas
title_full_unstemmed Enhancement of nano-RC switching delay due to the resistance blow-up in ingaas
title_sort enhancement of nano-rc switching delay due to the resistance blow-up in ingaas
publisher World Scientific Publishing, Singapore
publishDate 2007
url http://eprints.utm.my/id/eprint/8652/
http://dx.doi.org/10.1142/S1793292007000568
_version_ 1643645036388155392
score 13.211869