The role of silane gas flow rate on PECVD-assisted fabrication of silicon nanowires
Silicon (Si) core–shell nanowires (NWs) were successfully prepared by very high frequency plasma-enhanced chemical vapor deposition technique, and the effect of silane (SiH4) gas flow rates on physicochemical properties of silicon NWs was investigated. Field emission scanning electron microscopy (FE...
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| Format: | Article |
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Springer Verlag
2016
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| Online Access: | http://eprints.utm.my/id/eprint/73836/ https://www.scopus.com/inward/record.uri?eid=2-s2.0-84959087195&doi=10.1007%2fs00339-016-9713-7&partnerID=40&md5=40b7c393f0775fdaffd06012ed29d65c |
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