Optimization of ion implantation using trim software for the formation of shallow n+/p junction in germanium substrate

• Main Authors: Abdul Aziz, Umar, Nur Farhana Arissa, Nur Farhana Arissa, Aid, Siti Rahmah, Yahaya, Hafizal, Centeno, Anthony, Matsumoto, Satoru, Uedono, Akira, Mcphail, David
• Format: Conference or Workshop Item
• Language: English
• Published: 2015
• Subjects: QD Chemistry
• Online Access: http://eprints.utm.my/id/eprint/63400/1/SatoruMatsumoto2015_OptimizationofIonImplantationUsingTrimSoftware.pdf; http://eprints.utm.my/id/eprint/63400/

Silicon (Si) device down-scaling is facing a big challenge to maintain its high drive current capability along with lower leakage current. Due to its similarities with Si, the interest has been focused on Germanium (Ge) as a substitute for device substrate. However, there are major problems in fabri...