Gas phase analysis of SIC film deposition in PECVD using FTIR spectroscopy
Fourier Transform Infrared Spectroscopy was used to investigate the gas phase reactions during the deposition process of Silicon Carbide (SiC) film using VelY High Frequency - Plasma Enhanced Chemical Vapor Deposition (VHF-PECVD). The VHFPECVD operated at plasma excitation frequency of J50MHz and 25...
Saved in:
Main Authors: | , , , |
---|---|
Format: | Conference or Workshop Item |
Published: |
2015
|
Subjects: | |
Online Access: | http://eprints.utm.my/id/eprint/62101/ |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
id |
my.utm.62101 |
---|---|
record_format |
eprints |
spelling |
my.utm.621012017-05-09T07:19:59Z http://eprints.utm.my/id/eprint/62101/ Gas phase analysis of SIC film deposition in PECVD using FTIR spectroscopy Ismail, Abd. Khamim Omar, Muhammad Firdaus Raja Ibrahim, Raja Kamarulzaman Mustapha, Nursyahirah QD Chemistry Fourier Transform Infrared Spectroscopy was used to investigate the gas phase reactions during the deposition process of Silicon Carbide (SiC) film using VelY High Frequency - Plasma Enhanced Chemical Vapor Deposition (VHF-PECVD). The VHFPECVD operated at plasma excitation frequency of J50MHz and 25 W of RF power was applied to generate plasma. Argon (Ar) was used to initiate plasma while methane and silane gas was used as precursor to deposit SiC. Hydrogen gas was added to the system and the flow rates were varied from 0 to 500 sccm. FTIR absorption spectra were recorded during the deposition process and the dissociation of silane and methane gas was investigated. Silane found to be fully decomposed during the deposition and methane shows a dependency of hydrogen flow rates. 2015 Conference or Workshop Item PeerReviewed Ismail, Abd. Khamim and Omar, Muhammad Firdaus and Raja Ibrahim, Raja Kamarulzaman and Mustapha, Nursyahirah (2015) Gas phase analysis of SIC film deposition in PECVD using FTIR spectroscopy. In: Advances in Applied Plasma Science, 31 Aug-4 Sept, 2015, Japan. |
institution |
Universiti Teknologi Malaysia |
building |
UTM Library |
collection |
Institutional Repository |
continent |
Asia |
country |
Malaysia |
content_provider |
Universiti Teknologi Malaysia |
content_source |
UTM Institutional Repository |
url_provider |
http://eprints.utm.my/ |
topic |
QD Chemistry |
spellingShingle |
QD Chemistry Ismail, Abd. Khamim Omar, Muhammad Firdaus Raja Ibrahim, Raja Kamarulzaman Mustapha, Nursyahirah Gas phase analysis of SIC film deposition in PECVD using FTIR spectroscopy |
description |
Fourier Transform Infrared Spectroscopy was used to investigate the gas phase reactions during the deposition process of Silicon Carbide (SiC) film using VelY High Frequency - Plasma Enhanced Chemical Vapor Deposition (VHF-PECVD). The VHFPECVD operated at plasma excitation frequency of J50MHz and 25 W of RF power was applied to generate plasma. Argon (Ar) was used to initiate plasma while methane and silane gas was used as precursor to deposit SiC. Hydrogen gas was added to the system and the flow rates were varied from 0 to 500 sccm. FTIR absorption spectra were recorded during the deposition process and the dissociation of silane and methane gas was investigated. Silane found to be fully decomposed during the deposition and methane shows a dependency of hydrogen flow rates. |
format |
Conference or Workshop Item |
author |
Ismail, Abd. Khamim Omar, Muhammad Firdaus Raja Ibrahim, Raja Kamarulzaman Mustapha, Nursyahirah |
author_facet |
Ismail, Abd. Khamim Omar, Muhammad Firdaus Raja Ibrahim, Raja Kamarulzaman Mustapha, Nursyahirah |
author_sort |
Ismail, Abd. Khamim |
title |
Gas phase analysis of SIC film deposition in PECVD using FTIR spectroscopy |
title_short |
Gas phase analysis of SIC film deposition in PECVD using FTIR spectroscopy |
title_full |
Gas phase analysis of SIC film deposition in PECVD using FTIR spectroscopy |
title_fullStr |
Gas phase analysis of SIC film deposition in PECVD using FTIR spectroscopy |
title_full_unstemmed |
Gas phase analysis of SIC film deposition in PECVD using FTIR spectroscopy |
title_sort |
gas phase analysis of sic film deposition in pecvd using ftir spectroscopy |
publishDate |
2015 |
url |
http://eprints.utm.my/id/eprint/62101/ |
_version_ |
1643655322192052224 |
score |
13.160551 |