Morphological study of RF magnetron sputtered silicon thin films on aisi 304 stainless steel
Silicon thin films on AISI 304 stainless steel were deposited using RF magnetron sputtering. The effect of substrate temperature on the film properties were investigated as the films were prepared at different substrate temperature. Solid phase reaction between Si and Fe from the substr...
محفوظ في:
| المؤلفون الرئيسيون: | , , |
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| التنسيق: | مقال |
| اللغة: | English |
| منشور في: |
Penerbit UTM Press
2012
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| الموضوعات: | |
| الوصول للمادة أونلاين: | http://eprints.utm.my/id/eprint/47250/1/ZulhelmiAlifHalim2012_MorphologicalStudyofRFMagnetron.pdf http://eprints.utm.my/id/eprint/47250/ |
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| الملخص: | Silicon thin films on AISI 304 stainless steel were deposited using RF magnetron sputtering. The effect of
substrate temperature on the film properties were investigated as the films were prepared at different
substrate temperature. Solid phase reaction between Si and Fe from the substrate has led to the formation of
single crystal hexagonal shape Fe2Si layer on the surface of 304 stainless steel (cubic crystal). Film
morphology characterized by field emission scanning electron microscope (FE-SEM) and atomic force
microscope (AFM) showed the films acquired zone T microstructure and surface roughness was increased
with temperature. The film adhesion strength was determined according to VDI 3198 standard for
Rockwell-C indentation test. Results from indentation showed good films adhesion was formed and no
extended delamination of the films was observed. |
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