Room temperature Ge and ZnO embedded inside porous silicon using conventional methods for photonic application

In this paper we reported room temperature synthesis of embedded porous Si (PS) based structures using simple and low cost techniques of electrochemical etching and thermal evaporation. PS was prepared by anodization of Si wafer in ethanoic hydrofluoric acid (HF). The Ge and ZnO layers were deposite...

Full description

Saved in:
Bibliographic Details
Main Authors: Abd. Rahim, A. F., Hashim, M. R., Rusop, M., Ali, Nihad K., Yusuf, R.
Format: Article
Published: Elsevier 2012
Subjects:
Online Access:http://eprints.utm.my/id/eprint/33498/
http://dx.doi.org/10.1016/j.spmi.2012.07.018
Tags: Add Tag
No Tags, Be the first to tag this record!
Be the first to leave a comment!
You must be logged in first