Crystallization of poly-silicon film by different annealing techniques
Poly-Silicon is widely used in semiconductor devices especially in TFTs technology. Performance of silicon thin film depends on the degree of crystallization. Enhancing the crystalline is the ultimate goal in this annealing process. The best annealing process will be identified. Initially Al doped S...
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| Main Authors: | , |
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| Format: | Book Section |
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IEEE Explorer
2011
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| Subjects: | |
| Online Access: | http://eprints.utm.my/id/eprint/28947/ http://dx.doi.org/10.1109/SIECPC.2011.5877013 |
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