Simulation analysis on the impact of oblique rotating ion implantation (Ori) in fabricating novel structure of vertical NMOSFET

NMOSFET is a type of field-effect transistor (FET). It has an insulated gate, whose voltage determines the conductivity of the device. This ability to change conductivity with the amount of applied voltage can be used for amplifying or switching electronic signals.

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Bibliographic Details
Main Authors: Saad, Ismail, Ismail, Razali
Format: Conference or Workshop Item
Published: 2007
Subjects:
Online Access:http://eprints.utm.my/id/eprint/14418/
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