Effect of excess silicon concentration on the structural and optical characteristics of silicon nanocrystals embedded in silicon oxide
Silicon (Si) nanocrystals embedded in Si oxide matrix have been formed by rapid thermal annealing of sub-stoichiometric Si oxide films (SiOx with x < 2). The SiOx films were deposited by co-sputtering of Si oxide and Si target using magnetron RF sputtering technique. The Si-to-SiO2 ratio was cont...
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格式: | Conference or Workshop Item |
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2007
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在線閱讀: | http://eprints.utm.my/id/eprint/13939/ |
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