Surface Energy and Crystallite Size Comparisons by Applying Direct Current and Pulse Direct Current on Substrate Bias in PVD Process

• 主要な著者: Hashim, Hanizam, Md Nizam, Abd Rahman, Noraiham, Mohamad, Mohd Soufhwee, Abd Rahman
• フォーマット: 論文
• 言語: English
• 出版事項: Trans Tech Publications, Switzerland 2013
• 主題: TA Engineering (General). Civil engineering (General)
• オンライン･アクセス: http://eprints.utem.edu.my/id/eprint/7079/1/Hanizam-ICME2012.pdf; http://eprints.utem.edu.my/id/eprint/7079/; http://www.ttp.net/1660-9336.html

Surface morphology homogeneity and energy modifications for in situ PVD process are two critical factors to prevent unexpected adhesion failure during machining or service. Unlike during film depositing, there is still much gap to be explored on applying pulsed biasing concepts to the substrate duri...