Modeling And Optimization Of Physical Vapour Deposition Coating Process Parameters For Tin Grain Size Using Combined Genetic Algorithms With Response Surface Methodology

• Main Authors: Mohamad Jaya, Abdul Syukor, Muhamad, Mohd Razali, Abd Rahman, Md Nizam, Mohammad Jarrah, Mu'ath Ibrahim, Hasan Basari, Abd Samad
• Format: Article
• Language: English
• Published: JATIT & LLS 2015
• Subjects: T Technology (General); TA Engineering (General). Civil engineering (General)
• Online Access: http://eprints.utem.edu.my/id/eprint/20984/2/Paper1.pdf; http://eprints.utem.edu.my/id/eprint/20984/; http://www.jatit.org/volumes/Vol77No2/10Vol77No2.pdf

Optimization of thin film coating parameters is important in identifying the required output.Two main issues of the process of physical vapor deposition (PVD) are manufacturing costs and customization of cutting tool properties.The aim of this study is to identify optimal PVD coating process paramet...