Optimization of physical vapour deposition coating process parameters using genetic algorithm

Optimization of thin film coating parameter is an important task to identify the required output. In the process of physical vapor deposition (PVD), two main issues of the PVD process are cost of manufacturing and customization of the cutting tool properties. In general, a proper choice of the coati...

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Bibliographic Details
Main Author: Mohammad Jarrah, Mu'ath Ibrahim
Format: Thesis
Language:English
English
Published: 2014
Subjects:
Online Access:http://eprints.utem.edu.my/id/eprint/14993/1/Optimization%20Of%20Physical%20Vapour%20Deposition%20Coating%20Process%20Parameters%20Using%20Genetic%20Algorithm%2024pages.pdf
http://eprints.utem.edu.my/id/eprint/14993/2/Optimization%20of%20physical%20vapour%20deposition%20coating%20process%20parameters%20using%20genetic%20algorithm.pdf
http://eprints.utem.edu.my/id/eprint/14993/
https://plh.utem.edu.my/cgi-bin/koha/opac-detail.pl?biblionumber=92149
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