Ferroelectric Thin Film Materials Deposition By Physical Vapor Deposition
Thin film is a layer of material that has the thickness that ranging from a few nanometers to a few micrometers and have been used in the fabrication of the MEMS devices. The properties of the thin films are affected by the type of the materials and one of the thin film materials is the ferroelec...
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| Main Author: | |
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| Format: | Monograph |
| Language: | English |
| Published: |
Universiti Sains Malaysia
2019
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| Subjects: | |
| Online Access: | http://eprints.usm.my/58391/1/Ferroelectric%20Thin%20Film%20Materials%20Deposition%20By%20Physical%20Vapor%20Deposition.pdf http://eprints.usm.my/58391/ |
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| Summary: | Thin film is a layer of material that has the thickness that ranging from a few
nanometers to a few micrometers and have been used in the fabrication of the MEMS
devices. The properties of the thin films are affected by the type of the materials and
one of the thin film materials is the ferroelectric thin film material. It is a type of
material that exhibits polarization without the presence of the electric field. This
ferroelectric thin film material is widely used in the fabrication of
microelectromechanical systems (MEMS). There are a few manufacturing methods that
can apply to the manufacture of MEMS and one of them is the thin film deposition. In
this project, the thin film deposition technique used is the powder-based magnetron
sputtering. The powder-based magnetron sputtering is different from the conventional
magnetron sputtering because the thin film is deposited from the powder target. The
deposited thin films are characterized and the electrical properties of the thin films are
investigated. The characterization which involved the microstructural analysis and
elemental analysis are carried out for the thin film. Overall, the surface of the thin film
is smooth, and some may contain contaminant. The electrical properties of the thin films
are investigated through the piezoelectric functional test and temperature coefficient of
resistance (TCR) test. The piezoelectric coefficient and TCR are the characteristics that
needed to consider when designing MEMS devices. The PZT thin films were
undergoing piezoelectric functional test and the results indicated that the thin films
exhibited piezoelectric effect. In TCR test, the metal thin film (Sb thin film) shows a
positive TCR value whereas the non-metal thin film (MgO thin film) shows negative
TCR value. There are also some metal thin films such as Ti thin film and Cr thin film
that show negative TCR value and this may be due to the presence of the impurities and
defects. |
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