Characterization And Behaviour Of Silicon Dioxide Nanoparticles In Chemical Mechanical Polishing Wastewater With The Presence Of Ferrous Sulphate And Polyaluminium Chloride
In the twenty-first century, semiconductor industry is one of the most competitive manufacturing industries around worldwide. This is due to high demand of semiconductor for the manufacturing of electronic devices in this high technology era. While there are many wafers and chips produced daily from...
محفوظ في:
المؤلف الرئيسي: | |
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التنسيق: | Monograph |
اللغة: | English |
منشور في: |
Universiti Sains Malaysia
2017
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الموضوعات: | |
الوصول للمادة أونلاين: | http://eprints.usm.my/51952/1/Characterization%20And%20Behaviour%20Of%20Silicon%20Dioxide%20Nanoparticles%20In%20Chemical%20Mechanical%20Polishing%20Wastewater%20With%20The%20Presence%20Of%20Ferrous%20Sulphate%20And%20Polyaluminium%20Chloride_Sin%20Jing%20Yao_A9_2017.pdf http://eprints.usm.my/51952/ |
الوسوم: |
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الانترنت
http://eprints.usm.my/51952/1/Characterization%20And%20Behaviour%20Of%20Silicon%20Dioxide%20Nanoparticles%20In%20Chemical%20Mechanical%20Polishing%20Wastewater%20With%20The%20Presence%20Of%20Ferrous%20Sulphate%20And%20Polyaluminium%20Chloride_Sin%20Jing%20Yao_A9_2017.pdfhttp://eprints.usm.my/51952/