Characterization And Behaviour Of Silicon Dioxide Nanoparticles In Chemical Mechanical Polishing Wastewater With The Presence Of Ferrous Sulphate And Polyaluminium Chloride

In the twenty-first century, semiconductor industry is one of the most competitive manufacturing industries around worldwide. This is due to high demand of semiconductor for the manufacturing of electronic devices in this high technology era. While there are many wafers and chips produced daily from...

وصف كامل

محفوظ في:
التفاصيل البيبلوغرافية
المؤلف الرئيسي: Sin, Jing Yao
التنسيق: Monograph
اللغة:English
منشور في: Universiti Sains Malaysia 2017
الموضوعات:
الوصول للمادة أونلاين:http://eprints.usm.my/51952/1/Characterization%20And%20Behaviour%20Of%20Silicon%20Dioxide%20Nanoparticles%20In%20Chemical%20Mechanical%20Polishing%20Wastewater%20With%20The%20Presence%20Of%20Ferrous%20Sulphate%20And%20Polyaluminium%20Chloride_Sin%20Jing%20Yao_A9_2017.pdf
http://eprints.usm.my/51952/
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