Potential of polycrystalline GaN deposited by electron beam evaporator for metal-semiconductor-metal {MSM) photodetector device

Polycrystalline GaN has the potential in photodetector application for a wide range of ultraviolet (UV) light. Nonetheless, devices based on this material have not received much attention as compared to its single crystal counterpart. Therefore, this work describes one of the pioneering works on MSM...

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Main Authors: Ariff, A., Hassan, Z., Zainal, N.
Format: Conference or Workshop Item
Language:English
Published: 2017
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Online Access:http://eprints.usm.my/48817/1/NZ17_OP01.pdf%20done.pdf
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spelling my.usm.eprints.48817 http://eprints.usm.my/48817/ Potential of polycrystalline GaN deposited by electron beam evaporator for metal-semiconductor-metal {MSM) photodetector device Ariff, A. Hassan, Z. Zainal, N. QC1-999 Physics Polycrystalline GaN has the potential in photodetector application for a wide range of ultraviolet (UV) light. Nonetheless, devices based on this material have not received much attention as compared to its single crystal counterpart. Therefore, this work describes one of the pioneering works on MSM photodetector based polycrystalline GaN deposited by electron beam evaporator, which particularly investigates the effect of electrical contact on the performance of the photodetector. The deposition of GaN layer by the e-beam evaporator was followed by successive ammonia (NH3) annealing at a temperature of 950 °C. Aluminum (AI), indium-tin-oxide (ITO), nickel (Ni) and platinum (Pt) contacts were deposited via RF-sputtering on the polycrystalline GaN using a MSM metal mask. Overall, Ni is the most suitable electrical contact (especially at A= 385 nm) for the polycrystalline GaN based MSM photodetector than its counterparts. This relates to the presence of NixO inclusions inside the Ni contact due to diffusion of residual oxide from the surface of the polycrystalline GaN, which helps to increase carrier collection in the photodetector. With the Ni contact, the MSM photodetector demonstrated increasing gain behavior with bias voltage. Furthermore, the resistivity, internal quantum efficiency, rise time, recovery time and sensitivity were recorded at 2.02 MO.cm2, 3.13% (A=342 nm), 1. 75 sec, 1.87 sec and 5840%, respectively. More importantly, the MSM photodetector in this work showed a sharp responsivity at the wavelengths of 342 nm, 385 nm and 416 nm, which has extended the cut-off wavelength than other reported single crystal GaN based MSM photodetector. 2017-12-21 Conference or Workshop Item PeerReviewed application/pdf en http://eprints.usm.my/48817/1/NZ17_OP01.pdf%20done.pdf Ariff, A. and Hassan, Z. and Zainal, N. (2017) Potential of polycrystalline GaN deposited by electron beam evaporator for metal-semiconductor-metal {MSM) photodetector device. In: 4th Meeting of Malaysia Nitrides Research Group (MNRG 2017).
institution Universiti Sains Malaysia
building Hamzah Sendut Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Sains Malaysia
content_source USM Institutional Repository
url_provider http://eprints.usm.my/
language English
topic QC1-999 Physics
spellingShingle QC1-999 Physics
Ariff, A.
Hassan, Z.
Zainal, N.
Potential of polycrystalline GaN deposited by electron beam evaporator for metal-semiconductor-metal {MSM) photodetector device
description Polycrystalline GaN has the potential in photodetector application for a wide range of ultraviolet (UV) light. Nonetheless, devices based on this material have not received much attention as compared to its single crystal counterpart. Therefore, this work describes one of the pioneering works on MSM photodetector based polycrystalline GaN deposited by electron beam evaporator, which particularly investigates the effect of electrical contact on the performance of the photodetector. The deposition of GaN layer by the e-beam evaporator was followed by successive ammonia (NH3) annealing at a temperature of 950 °C. Aluminum (AI), indium-tin-oxide (ITO), nickel (Ni) and platinum (Pt) contacts were deposited via RF-sputtering on the polycrystalline GaN using a MSM metal mask. Overall, Ni is the most suitable electrical contact (especially at A= 385 nm) for the polycrystalline GaN based MSM photodetector than its counterparts. This relates to the presence of NixO inclusions inside the Ni contact due to diffusion of residual oxide from the surface of the polycrystalline GaN, which helps to increase carrier collection in the photodetector. With the Ni contact, the MSM photodetector demonstrated increasing gain behavior with bias voltage. Furthermore, the resistivity, internal quantum efficiency, rise time, recovery time and sensitivity were recorded at 2.02 MO.cm2, 3.13% (A=342 nm), 1. 75 sec, 1.87 sec and 5840%, respectively. More importantly, the MSM photodetector in this work showed a sharp responsivity at the wavelengths of 342 nm, 385 nm and 416 nm, which has extended the cut-off wavelength than other reported single crystal GaN based MSM photodetector.
format Conference or Workshop Item
author Ariff, A.
Hassan, Z.
Zainal, N.
author_facet Ariff, A.
Hassan, Z.
Zainal, N.
author_sort Ariff, A.
title Potential of polycrystalline GaN deposited by electron beam evaporator for metal-semiconductor-metal {MSM) photodetector device
title_short Potential of polycrystalline GaN deposited by electron beam evaporator for metal-semiconductor-metal {MSM) photodetector device
title_full Potential of polycrystalline GaN deposited by electron beam evaporator for metal-semiconductor-metal {MSM) photodetector device
title_fullStr Potential of polycrystalline GaN deposited by electron beam evaporator for metal-semiconductor-metal {MSM) photodetector device
title_full_unstemmed Potential of polycrystalline GaN deposited by electron beam evaporator for metal-semiconductor-metal {MSM) photodetector device
title_sort potential of polycrystalline gan deposited by electron beam evaporator for metal-semiconductor-metal {msm) photodetector device
publishDate 2017
url http://eprints.usm.my/48817/1/NZ17_OP01.pdf%20done.pdf
http://eprints.usm.my/48817/
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