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Effects of anodisation parameters on thin film properties: a review

Electrochemical anodisation is a well-received method in the complementary metal-oxide-semiconductor field as it is advantageous; best performed at room temperature which translates into being more affordable and a simple alternative to form nano-structured oxide films for different metals. The quin...

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Main Authors: Wong, Y.H., Affendy, M.G., Lau, S.K., Teh, P.C., Lee, H.J., Tan, C.Y., Ramesh, S.
Format: Article
Language:en_US
Published: 2017
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spelling my.uniten.dspace-57772018-03-12T10:03:17Z Effects of anodisation parameters on thin film properties: a review Wong, Y.H. Affendy, M.G. Lau, S.K. Teh, P.C. Lee, H.J. Tan, C.Y. Ramesh, S. Electrochemical anodisation is a well-received method in the complementary metal-oxide-semiconductor field as it is advantageous; best performed at room temperature which translates into being more affordable and a simple alternative to form nano-structured oxide films for different metals. The quintessential parameters involved allow numerous formations of metal oxide films according to desired morphology and thickness. Therefore, this paper aims to review the effects of anodising parameters such as applied voltage, concentration, temperature, time, current density and post-anodisation annealing among them. © 2016 Institute of Materials, Minerals and Mining. 2017-12-08T07:24:52Z 2017-12-08T07:24:52Z 2017 Article 10.1080/02670836.2016.1193654 en_US Volume 33, Issue 6, 13 April 2017, Pages 699-711
institution Universiti Tenaga Nasional
building UNITEN Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Tenaga Nasional
content_source UNITEN Institutional Repository
url_provider http://dspace.uniten.edu.my/
language en_US
description Electrochemical anodisation is a well-received method in the complementary metal-oxide-semiconductor field as it is advantageous; best performed at room temperature which translates into being more affordable and a simple alternative to form nano-structured oxide films for different metals. The quintessential parameters involved allow numerous formations of metal oxide films according to desired morphology and thickness. Therefore, this paper aims to review the effects of anodising parameters such as applied voltage, concentration, temperature, time, current density and post-anodisation annealing among them. © 2016 Institute of Materials, Minerals and Mining.
format Article
author Wong, Y.H.
Affendy, M.G.
Lau, S.K.
Teh, P.C.
Lee, H.J.
Tan, C.Y.
Ramesh, S.
spellingShingle Wong, Y.H.
Affendy, M.G.
Lau, S.K.
Teh, P.C.
Lee, H.J.
Tan, C.Y.
Ramesh, S.
Effects of anodisation parameters on thin film properties: a review
author_facet Wong, Y.H.
Affendy, M.G.
Lau, S.K.
Teh, P.C.
Lee, H.J.
Tan, C.Y.
Ramesh, S.
author_sort Wong, Y.H.
title Effects of anodisation parameters on thin film properties: a review
title_short Effects of anodisation parameters on thin film properties: a review
title_full Effects of anodisation parameters on thin film properties: a review
title_fullStr Effects of anodisation parameters on thin film properties: a review
title_full_unstemmed Effects of anodisation parameters on thin film properties: a review
title_sort effects of anodisation parameters on thin film properties: a review
publishDate 2017
_version_ 1644493773268320256
score 13.214268

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