Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi's L27 orthogonal array

Silicon-on-insulator (SOI)-based lateral PIN photodiodes using SiGe/Si multilayer quantum wells (MQW) are suitable for applications in the near-infrared range both for sensing and optical fiber communication application. The objective of this paper is to optimize the process parameters for such a de...

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Main Authors: Menon P.S., Tasirin S.K., Ahmad I., Abdullah S.F., Apte P.R.
Other Authors: 57201289731
Format: Conference paper
Published: 2023
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SOI
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spelling my.uniten.dspace-294232023-12-28T12:13:00Z Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi's L27 orthogonal array Menon P.S. Tasirin S.K. Ahmad I. Abdullah S.F. Apte P.R. 57201289731 55602329100 12792216600 14319069500 55725529100 L<sub>27</sub> orthogonal array photodiode quantum dot SiGe/Si SOI Taguchi method Photodiodes Semiconductor quantum wells Taguchi methods Fabrication parameters Lateral PIN photodiodes Optimization approach Orthogonal array quantum dot SiGe/Si Silicon-on-insulators SOI Optimization Silicon-on-insulator (SOI)-based lateral PIN photodiodes using SiGe/Si multilayer quantum wells (MQW) are suitable for applications in the near-infrared range both for sensing and optical fiber communication application. The objective of this paper is to optimize the process parameters for such a device using Taguchi's L27 orthogonal array. Five device process parameters and two device noise factors were identified to make the virtual device design insensitive to variation in the selected fabrication parameters. The results obtained for responsivity after the optimization approach was 0.33 A/W for the optimized device with intrinsic region length of 6 ?m, photo-absorption layer thickness of 0.505 ?m, incident optical power of 0.5 mW/cm2, bias voltage of 3.5 V and SOI layer thickness of 0.5 ?m. The percentage of improvement for the device's responsivity is 27% as compared to the previous work. � 2013 IEEE. Final 2023-12-28T04:13:00Z 2023-12-28T04:13:00Z 2013 Conference paper 10.1109/RSM.2013.6706523 2-s2.0-84893532139 https://www.scopus.com/inward/record.uri?eid=2-s2.0-84893532139&doi=10.1109%2fRSM.2013.6706523&partnerID=40&md5=d156db776d826b995baed659e5e3d50d https://irepository.uniten.edu.my/handle/123456789/29423 6706523 254 257 Scopus
institution Universiti Tenaga Nasional
building UNITEN Library
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continent Asia
country Malaysia
content_provider Universiti Tenaga Nasional
content_source UNITEN Institutional Repository
url_provider http://dspace.uniten.edu.my/
topic L<sub>27</sub> orthogonal array
photodiode
quantum dot
SiGe/Si
SOI
Taguchi method
Photodiodes
Semiconductor quantum wells
Taguchi methods
Fabrication parameters
Lateral PIN photodiodes
Optimization approach
Orthogonal array
quantum dot
SiGe/Si
Silicon-on-insulators
SOI
Optimization
spellingShingle L<sub>27</sub> orthogonal array
photodiode
quantum dot
SiGe/Si
SOI
Taguchi method
Photodiodes
Semiconductor quantum wells
Taguchi methods
Fabrication parameters
Lateral PIN photodiodes
Optimization approach
Orthogonal array
quantum dot
SiGe/Si
Silicon-on-insulators
SOI
Optimization
Menon P.S.
Tasirin S.K.
Ahmad I.
Abdullah S.F.
Apte P.R.
Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi's L27 orthogonal array
description Silicon-on-insulator (SOI)-based lateral PIN photodiodes using SiGe/Si multilayer quantum wells (MQW) are suitable for applications in the near-infrared range both for sensing and optical fiber communication application. The objective of this paper is to optimize the process parameters for such a device using Taguchi's L27 orthogonal array. Five device process parameters and two device noise factors were identified to make the virtual device design insensitive to variation in the selected fabrication parameters. The results obtained for responsivity after the optimization approach was 0.33 A/W for the optimized device with intrinsic region length of 6 ?m, photo-absorption layer thickness of 0.505 ?m, incident optical power of 0.5 mW/cm2, bias voltage of 3.5 V and SOI layer thickness of 0.5 ?m. The percentage of improvement for the device's responsivity is 27% as compared to the previous work. � 2013 IEEE.
author2 57201289731
author_facet 57201289731
Menon P.S.
Tasirin S.K.
Ahmad I.
Abdullah S.F.
Apte P.R.
format Conference paper
author Menon P.S.
Tasirin S.K.
Ahmad I.
Abdullah S.F.
Apte P.R.
author_sort Menon P.S.
title Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi's L27 orthogonal array
title_short Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi's L27 orthogonal array
title_full Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi's L27 orthogonal array
title_fullStr Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi's L27 orthogonal array
title_full_unstemmed Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi's L27 orthogonal array
title_sort responsivity optimization of a mqw soi-based lateral pin photodiode using taguchi's l27 orthogonal array
publishDate 2023
_version_ 1806428509888839680
score 13.222552