High-Aspect-Ratio Silicon Nanostructures on N-type Silicon Wafer Using Metal-Assisted Chemical Etching (MACE) Technique

Aspect ratio; Catalysts; Etching; Hydrofluoric acid; Light; Metals; Photons; Porosity; Silicon solar cells; Silicon wafers; Surface roughness; Textures; Chemical etching technique; High aspect ratio; High aspect ratio microstructures; Metal-assisted chemical etching; Nanowire formation; Roughness pa...

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Bibliographic Details
Main Authors: Razak N.H.A., Amin N., Kiong T.S., Sopian K., Akhtaruzzaman M.
Other Authors: 54397656800
Format: Conference Paper
Published: Institute of Electrical and Electronics Engineers Inc. 2023
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Description
Summary:Aspect ratio; Catalysts; Etching; Hydrofluoric acid; Light; Metals; Photons; Porosity; Silicon solar cells; Silicon wafers; Surface roughness; Textures; Chemical etching technique; High aspect ratio; High aspect ratio microstructures; Metal-assisted chemical etching; Nanowire formation; Roughness parameters; Silicon microstructures; Silicon nano structure (SiNS); Silicon wafer surface; Solar cell and reflectance; Nanowires