Modelling of 14NM gate length La2O3-based n-type MOSFET

Gate length shrinkage is still the widely used method in transistor downsizing. In view of this, the downsizing of Equivalent Oxide Thickness (EOT) is also of high importance as it is the main focus in the process. Therefore, various studies on Metal Oxide Semiconductor Field Effect Transistors (MOS...

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Main Authors: Mah S.K., Ahmad I., Ker P.J., Noor Faizah Z.A.
其他作者: 57191706660
格式: Article
出版: Universiti Teknikal Malaysia Melaka 2023
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