Investigating the Impact of Deposition Power on PVD Growth WS2 for Solar Cell Application
Physical Vapor Deposition (PVD) was used to grow ultra-thin tungsten di sulfide (WS2) layers on top of soda lime glass substrates. Deposition power of radio frequency magnetron sputtering was varied (50W, 100 W, 150 W,200 W and 250 W) to study its impact on film characteristics for suitable applicat...
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| Main Authors: | , , , , |
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| Format: | Conference Paper |
| Language: | English |
| Published: |
2020
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| Summary: | Physical Vapor Deposition (PVD) was used to grow ultra-thin tungsten di sulfide (WS2) layers on top of soda lime glass substrates. Deposition power of radio frequency magnetron sputtering was varied (50W, 100 W, 150 W,200 W and 250 W) to study its impact on film characteristics for suitable application in solar cell. Structural, morphological and opto-electrical properties of as grown film were analyzed. Optimized monocrystalline ultra-thin WS2 films of enhance crystallite (690 nm thick) were successfully hoarded with RF power of 150 W under 100°C temperature. © 2019 IEEE. |
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