Stability of Chlorine Termination on Ge(100) and Ge(111) Surfaces

• Main Authors: Siti Kudnie, Sahari, Muhammad, Kashif, Marini, Sawawi, Nik Amni Fathi, Nik Zaini Fathi, Azrul Azlan, Hamzah, Burhanuddin, Yeop Majlis, Norsuzailina, Mohamed Sutan, Rohana, Sapawi, Kuryati, Kipli, Nurul Atiqah, Abdul Halim, Nazreen, Junaidi, Sharifah Masniah, Wan Masra
• Format: Article
• Language: English
• Published: EDP Sciences 2017
• Subjects: TD Environmental technology. Sanitary engineering
• Online Access: http://ir.unimas.my/id/eprint/17378/1/Nik%20Amni.pdf; http://ir.unimas.my/id/eprint/17378/; https://www.matec-conferences.org/articles/matecconf/abs/2017/01/matecconf_encon2017_05005/matecconf_encon2017_05005.html

The different cleaning solution; HCl and HF solution are used to remove the suboxide and oxide component on Ge surface. The HCl cleaning results chlorine (Cl) termination on Ge surface whereas no Fluorine (F) termination was observed just after HF cleaning. The growth of Ge oxide is studied after t...