Nanowire formation using electron beam lithography
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American Institute of Physics
2010
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my.unimap-88252010-08-18T07:23:58Z Nanowire formation using electron beam lithography Rahman, S. F. A. Uda, Hashim, Prof. Dr. Mohammad Nuzaihan, Md Nor Mohamed Nuri, A. M. Mohamad Emi Azri, Shohini Salleh, S. Electron beam lithography Elphy quantum Nanowire design International Conference on Nanoscience and Nanotechnology Link to publisher's homepage at http://www.aip.org/ Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly insufficient. In this paper, the recent development of the silicon nanowire based on electron beam lithography technique is reviewed. EBL technology is a best tool to fabricate patterns having nanometer feature sizes. In this project, the exposure process was carried out by an inhouse modified electron beam writing system using JOEL JSM 6460LA SEM integrated with ELPHY Quantum pattern generator. Following an introduction of this technique, the software description, pattern design formation and resist development are separately examined and discussed. 2010-08-18T07:23:58Z 2010-08-18T07:23:58Z 2009-06-01 Working Paper Vol.1136, 2009, p.504-508 0094-243X http://link.aip.org/link/?APCPCS/1136/504/1 http://hdl.handle.net/123456789/8825 en Proceedings of the International Conference on Nanoscience and Nanotechnology 2008 American Institute of Physics |
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English |
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Electron beam lithography Elphy quantum Nanowire design International Conference on Nanoscience and Nanotechnology |
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Electron beam lithography Elphy quantum Nanowire design International Conference on Nanoscience and Nanotechnology Rahman, S. F. A. Uda, Hashim, Prof. Dr. Mohammad Nuzaihan, Md Nor Mohamed Nuri, A. M. Mohamad Emi Azri, Shohini Salleh, S. Nanowire formation using electron beam lithography |
| description |
Link to publisher's homepage at http://www.aip.org/ |
| format |
Working Paper |
| author |
Rahman, S. F. A. Uda, Hashim, Prof. Dr. Mohammad Nuzaihan, Md Nor Mohamed Nuri, A. M. Mohamad Emi Azri, Shohini Salleh, S. |
| author_facet |
Rahman, S. F. A. Uda, Hashim, Prof. Dr. Mohammad Nuzaihan, Md Nor Mohamed Nuri, A. M. Mohamad Emi Azri, Shohini Salleh, S. |
| author_sort |
Rahman, S. F. A. |
| title |
Nanowire formation using electron beam lithography |
| title_short |
Nanowire formation using electron beam lithography |
| title_full |
Nanowire formation using electron beam lithography |
| title_fullStr |
Nanowire formation using electron beam lithography |
| title_full_unstemmed |
Nanowire formation using electron beam lithography |
| title_sort |
nanowire formation using electron beam lithography |
| publisher |
American Institute of Physics |
| publishDate |
2010 |
| url |
http://dspace.unimap.edu.my/xmlui/handle/123456789/8825 |
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1643789216180600832 |
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13.214268 |