Pattern designed for combination of optical lithography and electron beam lithography

• Main Authors: S. Fatimah, Abd Rahman, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor, A. M., Mohamed Nuri, Muhamad Emi Azri, Shohini
• Format: Working Paper
• Language: English
• Published: Universiti Malaysia Pahang 2010
• Subjects: Electron beam lithogrphy; Optical lithography; Nanowire; Silicon on insulator (SOI); Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/8821

Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, P...