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Pattern designed for combination of optical lithography and electron beam lithography

Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, P...

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Main Authors: S. Fatimah, Abd Rahman, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor, A. M., Mohamed Nuri, Muhamad Emi Azri, Shohini
Format: Working Paper
Language:English
Published: Universiti Malaysia Pahang 2010
Subjects:
Electron beam lithogrphy
Optical lithography
Nanowire
Silicon on insulator (SOI)
Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/8821
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spelling my.unimap-88212010-08-18T06:42:01Z Pattern designed for combination of optical lithography and electron beam lithography S. Fatimah, Abd Rahman Uda, Hashim, Prof. Dr. Mohammad Nuzaihan, Md Nor A. M., Mohamed Nuri Muhamad Emi Azri, Shohini Electron beam lithogrphy Optical lithography Nanowire Silicon on insulator (SOI) Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia. In this paper the fabricated pattern of nanometer and micrometer structures created with electron beam lithography (EBL) and optical lithography on silicon on insulator (SOI) material is presented. The resist used to demonstrate this EBL pattern creation is ma-N 2403 which is a negative tone photoresist series, while positive resist is used for transform mask design using optical lithography. Three different patterns structures are fabricated on the sample namely alignment mark, silicon nanowire and metal pad. Silicon nanowire is designed using GDS II Editor Software and exposed using SEM based EBL system while alignment mark and metal pad are designed using AutoCAD and exposed using conventional photolithography process. The fabricated structures are observed using high power microscope and SEM imaging. 2010-08-18T06:42:01Z 2010-08-18T06:42:01Z 2009-06-20 Working Paper p.1-4 http://hdl.handle.net/123456789/8821 en Proceedings of the Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) 2009 Universiti Malaysia Pahang
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Electron beam lithogrphy
Optical lithography
Nanowire
Silicon on insulator (SOI)
Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
spellingShingle Electron beam lithogrphy
Optical lithography
Nanowire
Silicon on insulator (SOI)
Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
S. Fatimah, Abd Rahman
Uda, Hashim, Prof. Dr.
Mohammad Nuzaihan, Md Nor
A. M., Mohamed Nuri
Muhamad Emi Azri, Shohini
Pattern designed for combination of optical lithography and electron beam lithography
description Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia.
format Working Paper
author S. Fatimah, Abd Rahman
Uda, Hashim, Prof. Dr.
Mohammad Nuzaihan, Md Nor
A. M., Mohamed Nuri
Muhamad Emi Azri, Shohini
author_facet S. Fatimah, Abd Rahman
Uda, Hashim, Prof. Dr.
Mohammad Nuzaihan, Md Nor
A. M., Mohamed Nuri
Muhamad Emi Azri, Shohini
author_sort S. Fatimah, Abd Rahman
title Pattern designed for combination of optical lithography and electron beam lithography
title_short Pattern designed for combination of optical lithography and electron beam lithography
title_full Pattern designed for combination of optical lithography and electron beam lithography
title_fullStr Pattern designed for combination of optical lithography and electron beam lithography
title_full_unstemmed Pattern designed for combination of optical lithography and electron beam lithography
title_sort pattern designed for combination of optical lithography and electron beam lithography
publisher Universiti Malaysia Pahang
publishDate 2010
url http://dspace.unimap.edu.my/xmlui/handle/123456789/8821
_version_ 1643789215266242560
score 13.211869

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