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Influence of annealing temperature on some properties of TiO2/Au thin films prepared by rf and dc magnetron sputtering methods

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Main Author: Azhar Kadhim Sadkhan
Other Authors: azhar.k.sadkhan@uotechnology.edu.iq
Format: Article
Language:English
Published: Universiti Malaysia Perlis (UniMAP) 2022
Subjects:
RF and DC Sputtering
Thin films
Thermal Annealing
Titanium dioxide
Online Access:http://dspace.unimap.edu.my:80/xmlui/handle/123456789/76351
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spelling my.unimap-763512022-10-07T01:40:13Z Influence of annealing temperature on some properties of TiO2/Au thin films prepared by rf and dc magnetron sputtering methods Azhar Kadhim Sadkhan azhar.k.sadkhan@uotechnology.edu.iq Laser and Optoelectronics Engineering Department, University of Technology, Iraq RF and DC Sputtering Thin films Thermal Annealing Titanium dioxide Link to publisher's homepage at http://ijneam.unimap.edu.my This paper uses RF and DC magnetron sputtering techniques to prepare TiO2/Au thin film on glass substrates. TiO2thin film was deposited under a power of 150 Watt for 90 min. by RF magnetron sputtering technique and achieved 132.6 nm thickness, while Au thin film was deposited under a power of 20 Watt for 15 min. by DC magnetron sputtering technique achieving 20 nm thickness. Afterward, these samples were annealed in different temperatures (150, 200, 250 and 300) ºC respectively for about 1 hr that led these thin films to be more crystalline in structure after annealing. X-ray Diffraction (XRD) revealed a high grain size equal to 9.077nm, which has a sharp peak R(220) at 64.65 º in 300 ºC. Atomic force microscopy (AFM) showed the structural properties as the average roughness after annealing about 4.68 nm in 300 ºC. All the obtained films are highly oriented in direction having nanocrystalline phase. The optical properties were examined by UV-VIS spectroscopy that showed increases in transmittance in the range of 35 % - 75 %, absorption coefficient from the region of high absorbing wavelength at 400nm, and reduction in energy gaps to (3.25 eV, 3.12 eV, 3.01 eV, and 2.95 eV) when annealing temperatures were increased. These results indicated the most suitable growth conditions for obtaining high-quality sputtered TiO2/Au thin films with a higher transparency performance for solar cells applications. 2022-10-07T01:40:13Z 2022-10-07T01:40:13Z 2022-01 Article International Journal of Nanoelectronics and Materials, vol.15(1), 2022, pages 61-70 1985-5761 (Printed) 2232-1535 (online) http://dspace.unimap.edu.my:80/xmlui/handle/123456789/76351 en Universiti Malaysia Perlis (UniMAP)
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic RF and DC Sputtering
Thin films
Thermal Annealing
Titanium dioxide
spellingShingle RF and DC Sputtering
Thin films
Thermal Annealing
Titanium dioxide
Azhar Kadhim Sadkhan
Influence of annealing temperature on some properties of TiO2/Au thin films prepared by rf and dc magnetron sputtering methods
description Link to publisher's homepage at http://ijneam.unimap.edu.my
author2 azhar.k.sadkhan@uotechnology.edu.iq
author_facet azhar.k.sadkhan@uotechnology.edu.iq
Azhar Kadhim Sadkhan
format Article
author Azhar Kadhim Sadkhan
author_sort Azhar Kadhim Sadkhan
title Influence of annealing temperature on some properties of TiO2/Au thin films prepared by rf and dc magnetron sputtering methods
title_short Influence of annealing temperature on some properties of TiO2/Au thin films prepared by rf and dc magnetron sputtering methods
title_full Influence of annealing temperature on some properties of TiO2/Au thin films prepared by rf and dc magnetron sputtering methods
title_fullStr Influence of annealing temperature on some properties of TiO2/Au thin films prepared by rf and dc magnetron sputtering methods
title_full_unstemmed Influence of annealing temperature on some properties of TiO2/Au thin films prepared by rf and dc magnetron sputtering methods
title_sort influence of annealing temperature on some properties of tio2/au thin films prepared by rf and dc magnetron sputtering methods
publisher Universiti Malaysia Perlis (UniMAP)
publishDate 2022
url http://dspace.unimap.edu.my:80/xmlui/handle/123456789/76351
_version_ 1751537905403166720
score 13.222552

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