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Process control of reactive magnetron sputtering of thin films of zirconium dioxides

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Bibliographic Details
Main Author: Swady, Raad A.
Other Authors: albdeery@unizwa.edu.om.
Format: Article
Language:English
Published: Universiti Malaysia Perlis 2016
Subjects:
DC magnetron sputtering
Plasma emission
Optical properties
Online Access:http://dspace.unimap.edu.my:80/xmlui/handle/123456789/41231
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spelling my.unimap-412312017-11-21T03:32:06Z Process control of reactive magnetron sputtering of thin films of zirconium dioxides Swady, Raad A. albdeery@unizwa.edu.om. DC magnetron sputtering Plasma emission Optical properties Link to publisher's homepage at http://ijneam.unimap.edu.my/ Thin films of zirconium dioxides were deposited on room temperature glass substrates using emission from the dc magnetron sputtering plasma glow discharge as a process control for the reactive process inside the deposition chamber in low pumping speed vacuum system. An unbalanced magnetron source was used in an enclosed volume, within a vacuum chamber,into which oxygen gas was admitted. A systematic control of the reactive gas partial pressure allows injection of reactive gas into the deposition chamber, provided with a fast response time by observation of the spectral line emission of the sputtered zirconium target. This feedback look control allowed the production localized-optimized films of Zirconium dioxides. The optical quality and optimization process were assessed by ellipsometry and spectrophotometry. 2016-03-31T04:39:52Z 2016-03-31T04:39:52Z 2011 Article International Journal of Nanoelectronics and Materials, vol.4 (1), 2011, pages 85-89 1985-5761 (Printed) 1997-4434 (Online) http://ijneam.unimap.edu.my/ http://dspace.unimap.edu.my:80/xmlui/handle/123456789/41231 en Universiti Malaysia Perlis
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic DC magnetron sputtering
Plasma emission
Optical properties
spellingShingle DC magnetron sputtering
Plasma emission
Optical properties
Swady, Raad A.
Process control of reactive magnetron sputtering of thin films of zirconium dioxides
description Link to publisher's homepage at http://ijneam.unimap.edu.my/
author2 albdeery@unizwa.edu.om.
author_facet albdeery@unizwa.edu.om.
Swady, Raad A.
format Article
author Swady, Raad A.
author_sort Swady, Raad A.
title Process control of reactive magnetron sputtering of thin films of zirconium dioxides
title_short Process control of reactive magnetron sputtering of thin films of zirconium dioxides
title_full Process control of reactive magnetron sputtering of thin films of zirconium dioxides
title_fullStr Process control of reactive magnetron sputtering of thin films of zirconium dioxides
title_full_unstemmed Process control of reactive magnetron sputtering of thin films of zirconium dioxides
title_sort process control of reactive magnetron sputtering of thin films of zirconium dioxides
publisher Universiti Malaysia Perlis
publishDate 2016
url http://dspace.unimap.edu.my:80/xmlui/handle/123456789/41231
_version_ 1643802786197929984
score 13.222552

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