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Fabrication of nano and micrometer structures using electron beam and optical mixed lithography process

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Main Authors: Abd Rahman, S. F., Shohini, M. E. A., Uda, Hashim, Mohammad Nuzaihan, Md Nor
Other Authors: aeiou0410@yahoo.co.uk.
Format: Article
Language:English
Published: Universiti Malaysia Perlis 2016
Subjects:
Nanowires
Electron beam lithography
Device characteristics
Online Access:http://dspace.unimap.edu.my:80/xmlui/handle/123456789/41223
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spelling my.unimap-412232017-11-21T03:36:20Z Fabrication of nano and micrometer structures using electron beam and optical mixed lithography process Abd Rahman, S. F. Shohini, M. E. A. Uda, Hashim Mohammad Nuzaihan, Md Nor aeiou0410@yahoo.co.uk. Nanowires Electron beam lithography Device characteristics Link to publisher's homepage at http://ijneam.unimap.edu.my/ In this paper, the fabricated pattern of nanometer and micrometer structures created with electron beam lithography (EBL) and optical lithography on silicon on insulator (SOI) material are presented. The resist used to demostrate this EBL pattern creation is ma-V 2403 which is a negative tone photoresist series, while positive resist PRI-2000A is used to transform photomask design using optical lithography. Three different patterns structures are fabricated on each sample namely alignment mark, silicon, nanowire and metal pad. The JEOL scanning electron microscopy (SEM) has been modified to integrate with RAITH software to be used for electron beam lithography. Nano-scaled nanowires were first patterned by EBL and formed by ICP ething followed by micro-sized-contact pads were defined bt photolithography process. The approachICP etching followed by micro-sized -pad were defined by photlithography process. The approach describe in this paper is a mix-and-match techniques uising both conventional photholilthography and advanced nanolithoragraphy, making use of an alignment strategy. 2016-03-31T04:02:19Z 2016-03-31T04:02:19Z 2011 Article International Journal of Nanoelectronics and Materials, vol.4 (1), 2011, pages 49-58 1985-5761 (Printed) 1997-4434 (Online) http://ijneam.unimap.edu.my/ http://dspace.unimap.edu.my:80/xmlui/handle/123456789/41223 en Universiti Malaysia Perlis
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Nanowires
Electron beam lithography
Device characteristics
spellingShingle Nanowires
Electron beam lithography
Device characteristics
Abd Rahman, S. F.
Shohini, M. E. A.
Uda, Hashim
Mohammad Nuzaihan, Md Nor
Fabrication of nano and micrometer structures using electron beam and optical mixed lithography process
description Link to publisher's homepage at http://ijneam.unimap.edu.my/
author2 aeiou0410@yahoo.co.uk.
author_facet aeiou0410@yahoo.co.uk.
Abd Rahman, S. F.
Shohini, M. E. A.
Uda, Hashim
Mohammad Nuzaihan, Md Nor
format Article
author Abd Rahman, S. F.
Shohini, M. E. A.
Uda, Hashim
Mohammad Nuzaihan, Md Nor
author_sort Abd Rahman, S. F.
title Fabrication of nano and micrometer structures using electron beam and optical mixed lithography process
title_short Fabrication of nano and micrometer structures using electron beam and optical mixed lithography process
title_full Fabrication of nano and micrometer structures using electron beam and optical mixed lithography process
title_fullStr Fabrication of nano and micrometer structures using electron beam and optical mixed lithography process
title_full_unstemmed Fabrication of nano and micrometer structures using electron beam and optical mixed lithography process
title_sort fabrication of nano and micrometer structures using electron beam and optical mixed lithography process
publisher Universiti Malaysia Perlis
publishDate 2016
url http://dspace.unimap.edu.my:80/xmlui/handle/123456789/41223
_version_ 1643802784630308864
score 13.211869

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