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Design and fabrication of quantum dot single electron transistor structure using e-beam nanolithography

Link to publisher's homepage at http://ijneam.unimap.edu.my/

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Main Authors: Uda, Hashim, Sutikno, Madnasri, Zul Azhar, Zahid Jamal
Other Authors: uda@unimap.edu.my.
Format: Article
Language:English
Published: Universiti Malaysia Perlis 2016
Subjects:
E-beam lithography
Mask design
PADOX
Proximity effect
Quantum dot
Single electron transistor
Online Access:http://dspace.unimap.edu.my:80/xmlui/handle/123456789/41218
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spelling my.unimap-412182017-11-21T03:36:52Z Design and fabrication of quantum dot single electron transistor structure using e-beam nanolithography Uda, Hashim Sutikno, Madnasri Zul Azhar, Zahid Jamal uda@unimap.edu.my. E-beam lithography Mask design PADOX Proximity effect Quantum dot Single electron transistor Link to publisher's homepage at http://ijneam.unimap.edu.my/ Quantum dot single electron transistor (QD SET) is fabricated using e-beam nanolithography (EBL) and is continued with the combination process of pattern dependent oxidation (PADOX) and high density plasma etching. EBL was used to pattern the whole masks of SET fabrication which consist of mask for doped area separator and the rest are for the formation of: source-quantum dot-drain, poly-Si gate, point contact and metal pad respectively. All of these masks were designed using offline GDSII Editor Software and later been exposed by EBL integrated using the scanning electron microscopy (SEM). In this paper, the whole designs of SET masks which are successively patterned are demonstrated and their nanostructures characterizations using SEM and atomic force microscopy (AFM) are reported. We found that the shape and dimension biases of schematic and SEM images of masks were caused by proximity effect. Therefore, while designing the SET masks, proximity effect, used resist and EBL equipment resolution were considered. 2016-03-31T03:32:50Z 2016-03-31T03:32:50Z 2011 Article International Journal of Nanoelectronics and Materials, vol.4 (1), 2011, pages 85-91 1985-5761 (Printed) 1997-4434 (Online) http://dspace.unimap.edu.my:80/xmlui/handle/123456789/41218 en Universiti Malaysia Perlis
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic E-beam lithography
Mask design
PADOX
Proximity effect
Quantum dot
Single electron transistor
spellingShingle E-beam lithography
Mask design
PADOX
Proximity effect
Quantum dot
Single electron transistor
Uda, Hashim
Sutikno, Madnasri
Zul Azhar, Zahid Jamal
Design and fabrication of quantum dot single electron transistor structure using e-beam nanolithography
description Link to publisher's homepage at http://ijneam.unimap.edu.my/
author2 uda@unimap.edu.my.
author_facet uda@unimap.edu.my.
Uda, Hashim
Sutikno, Madnasri
Zul Azhar, Zahid Jamal
format Article
author Uda, Hashim
Sutikno, Madnasri
Zul Azhar, Zahid Jamal
author_sort Uda, Hashim
title Design and fabrication of quantum dot single electron transistor structure using e-beam nanolithography
title_short Design and fabrication of quantum dot single electron transistor structure using e-beam nanolithography
title_full Design and fabrication of quantum dot single electron transistor structure using e-beam nanolithography
title_fullStr Design and fabrication of quantum dot single electron transistor structure using e-beam nanolithography
title_full_unstemmed Design and fabrication of quantum dot single electron transistor structure using e-beam nanolithography
title_sort design and fabrication of quantum dot single electron transistor structure using e-beam nanolithography
publisher Universiti Malaysia Perlis
publishDate 2016
url http://dspace.unimap.edu.my:80/xmlui/handle/123456789/41218
_version_ 1643802783433883648
score 13.209306

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