Main effects study on plasma etched aluminium metallization

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Main Authors: Zaliman, Sauli, Dr., Retnasamy, Vithyacharan, Aaron, Koay Terr Yeow
Other Authors: zaliman@unimap.edu.my
Format: Article
Language:English
Published: Trans Tech Publications 2014
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Online Access:http://dspace.unimap.edu.my:80/dspace/handle/123456789/33693
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spelling my.unimap-336932014-04-14T13:22:36Z Main effects study on plasma etched aluminium metallization Zaliman, Sauli, Dr. Retnasamy, Vithyacharan Aaron, Koay Terr Yeow zaliman@unimap.edu.my Aluminum Design of experiment (DOE) Reactive Ion Etching (RIE) Surface roughness Link to publisher's homepage at http://www.ttp.net/ Main effects contributing to the quality of surface roughness on an etched aluminium metallization wafer using Reactive Ion Etching (RIE) was studied. A total of three controllable process variables, with eight sets of experiments were scrutinized using an orderly designed design of experiment (DOE). The three variables in the investigation are composed of CF4 gas, composed of O2 gas and RF power while time is constant. The estimate of effect calculated for composition of CF4 gas, composition of O2 gas and RF power are-2.205, -0.975, and-0.525 respectively. All factors gave negative effects. This implies that the surface roughness increases when the content of CF4, O2, and RF power is lower. The results suggest that the composition of CF4 gaseous as the most influential factor as its main effects plot has the steepest slope followed by oxygen and RF power. 2014-04-14T13:22:36Z 2014-04-14T13:22:36Z 2014-01 Article Applied Mechanics and Materials, vol.487, 2014, pages 195-198 1662-7482 http://dspace.unimap.edu.my:80/dspace/handle/123456789/33693 http://www.scientific.net/AMM.487.195 10.4028/www.scientific.net/AMM.487.195 en Trans Tech Publications
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Aluminum
Design of experiment (DOE)
Reactive Ion Etching (RIE)
Surface roughness
spellingShingle Aluminum
Design of experiment (DOE)
Reactive Ion Etching (RIE)
Surface roughness
Zaliman, Sauli, Dr.
Retnasamy, Vithyacharan
Aaron, Koay Terr Yeow
Main effects study on plasma etched aluminium metallization
description Link to publisher's homepage at http://www.ttp.net/
author2 zaliman@unimap.edu.my
author_facet zaliman@unimap.edu.my
Zaliman, Sauli, Dr.
Retnasamy, Vithyacharan
Aaron, Koay Terr Yeow
format Article
author Zaliman, Sauli, Dr.
Retnasamy, Vithyacharan
Aaron, Koay Terr Yeow
author_sort Zaliman, Sauli, Dr.
title Main effects study on plasma etched aluminium metallization
title_short Main effects study on plasma etched aluminium metallization
title_full Main effects study on plasma etched aluminium metallization
title_fullStr Main effects study on plasma etched aluminium metallization
title_full_unstemmed Main effects study on plasma etched aluminium metallization
title_sort main effects study on plasma etched aluminium metallization
publisher Trans Tech Publications
publishDate 2014
url http://dspace.unimap.edu.my:80/dspace/handle/123456789/33693
_version_ 1643797253967577088
score 13.214268