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The effect of pulse DC and DC substrate bias during in situ cleaning PVD process on surface roughness

Malaysian Technical Universities Conference on Engineering and Technology (MUCET) 2012 organised by technical universities under the Malaysian Technical Universities Network (MTUN), 20th - 21st November 2012 at Hotel Seri Malaysia, Kangar, Perlis, Malaysia.

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Main Authors:	Hanizam, Hashim, Mohd Saufhwee, Abd Rahman, Anuar, A.R, K., Md. Nizam, Abd. Rahman, Dr., Noraiham, Mohamad, Dr.
其他作者:	hanizam@utem.edu.my
格式:	Working Paper
语言:	English
出版:	Malaysian Technical Universities Network (MTUN) 2013
主题:	Physical vapor deposition Surface roughness Substrate bias Pulse direct current Tungsten carbide
在线阅读:	http://dspace.unimap.edu.my/xmlui/handle/123456789/27355
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