The effect of pulse DC and DC substrate bias during in situ cleaning PVD process on surface roughness

• Main Authors: Hanizam, Hashim, Mohd Saufhwee, Abd Rahman, Anuar, A.R, K., Md. Nizam, Abd. Rahman, Dr., Noraiham, Mohamad, Dr.
• Other Authors: [e-mail]
• Format: Working Paper
• Language: English
• Published: Malaysian Technical Universities Network (MTUN) 2013
• Subjects: Physical vapor deposition; Surface roughness; Substrate bias; Pulse direct current; Tungsten carbide
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/27355

Malaysian Technical Universities Conference on Engineering and Technology (MUCET) 2012 organised by technical universities under the Malaysian Technical Universities Network (MTUN), 20th - 21st November 2012 at Hotel Seri Malaysia, Kangar, Perlis, Malaysia.