Resist uniformity evaluation through swing curve phenomena

• Main Authors: Uda, Hashim, Prof. Dr., Tijjani Adam, Shuwa
• Other Authors: [e-mail]
• Format: Article
• Language: English
• Published: INSInet Publications 2013
• Subjects: Clearing point (dose to clear); Coater; Critical dimension; Elipsometer; Stepper; Wafer
• Online Access: http://dspace.unimap.edu.my/xmlui/handle/123456789/26639

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