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Resist uniformity evaluation through swing curve phenomena

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Main Authors: Uda, Hashim, Prof. Dr., Tijjani Adam, Shuwa
Other Authors: uda@unimap.edu.my
Format: Article
Language:English
Published: INSInet Publications 2013
Subjects:
Clearing point (dose to clear)
Coater
Critical dimension
Elipsometer
Stepper
Wafer
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/26639
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spelling my.unimap-266392014-04-08T08:58:57Z Resist uniformity evaluation through swing curve phenomena Uda, Hashim, Prof. Dr. Tijjani Adam, Shuwa uda@unimap.edu.my tijjaniadam@yahoo.com Clearing point (dose to clear) Coater Critical dimension Elipsometer Stepper Wafer Link to publisher's homepage at http://www.aensiweb.com/ In fabrication of Micro/ Nano structure, alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital; each mask needs to be precisely aligned with original alignment mark. Otherwise, it can't successfully transfer the original pattern to the wafer surface causing device and circuit failure and the photo resist must be very sensitive to the exposure light to achieve reasonable throughput and the standard thickness should be 1.2μm. 24 wafers are used in this study, the wafers are separated into 2 sets, and each set which consists of 12 wafers. The first set is coated, exposed and development and the second set is also exposed and developed after being coated. after the wafer went through the standard cleaning procedure, the wafers were then coated using standard recipes which the spin speed ranging from 6500 to 7600 rpm in 100 rpm incremental Subsequently, the photoresist thickness of each wafer is measured using elipsometer. The study revealed that the minima for the dose-to-clear are at 7200 rpm where the thickness is 1.21 μm. Though, the result is slightly thicker than the expected 1.2 μm. This may be due to some unavoidable experimental errors and may due to the changing k' of the coater because coater is a bit old. 2013-07-13T08:54:35Z 2013-07-13T08:54:35Z 2012 Article Journal of Applied Sciences Research, vol. 8(8), 2012, pages 4268-4272 1816-157X http://www.aensiweb.com/jasr/jasr/2012/4268-4272.pdf http://hdl.handle.net/123456789/26639 en INSInet Publications
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Clearing point (dose to clear)
Coater
Critical dimension
Elipsometer
Stepper
Wafer
spellingShingle Clearing point (dose to clear)
Coater
Critical dimension
Elipsometer
Stepper
Wafer
Uda, Hashim, Prof. Dr.
Tijjani Adam, Shuwa
Resist uniformity evaluation through swing curve phenomena
description Link to publisher's homepage at http://www.aensiweb.com/
author2 uda@unimap.edu.my
author_facet uda@unimap.edu.my
Uda, Hashim, Prof. Dr.
Tijjani Adam, Shuwa
format Article
author Uda, Hashim, Prof. Dr.
Tijjani Adam, Shuwa
author_sort Uda, Hashim, Prof. Dr.
title Resist uniformity evaluation through swing curve phenomena
title_short Resist uniformity evaluation through swing curve phenomena
title_full Resist uniformity evaluation through swing curve phenomena
title_fullStr Resist uniformity evaluation through swing curve phenomena
title_full_unstemmed Resist uniformity evaluation through swing curve phenomena
title_sort resist uniformity evaluation through swing curve phenomena
publisher INSInet Publications
publishDate 2013
url http://dspace.unimap.edu.my/xmlui/handle/123456789/26639
_version_ 1643795009542029312
score 13.160551

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