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Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization

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Bibliographic Details
Main Author: Uda, Hashim, Prof. Dr.
Other Authors: uda@unimap.edu.my
Format: Working Paper
Language:English
Published: American Institute of Physics 2013
Subjects:
Biosensor
CMOS process
E-beam lithography
Nanowires
Silicon
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/26633
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spelling my.unimap-266332018-02-28T04:19:25Z Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization Uda, Hashim, Prof. Dr. uda@unimap.edu.my Biosensor CMOS process E-beam lithography Nanowires Silicon Link to publisher's homepage at http://www.aip.org/ Silicon nanowires (SiNWs) have attracted significant interest in the study because of their potential to impact applications from nanoscale electronics to biomedical engineering. E-Beam Lithography couple with standard CMOS process is employed to fabricate the device. The exposure doses for the resist layer are varied in the range of 50 μC/cm2 to 180 μC/cm2 at 20 kV accelerating voltage with a beam current of 0.075 nA. The nanowires resist masks are well developed with dimension of less than 100 nm in width for the dose exposure parameters of 80 μC/cm2, 100 μC/cm2 and 120 μC/cm2. It is found that, the smallest SiNW with diameter of 65 nm is well aligned with electrode pads. In terms of sensitivity, the device with smaller nanowire is found to be more sensitive as a result of the high surface-to-volume ratio. These results demonstrate that the in-house fabricated SiNWs biosensor is capable as a platform for label-free biosensing. 2013-07-13T05:44:04Z 2013-07-13T05:44:04Z 2012-06-06 Working Paper AIP Conference Proceedings, vol. 1502(1), 2012, pages 26-33 978-0-7354-1119-7 0094-243X http://proceedings.aip.org/resource/2/apcpcs/1502/1/26_1 http://hdl.handle.net/123456789/26633 en Proceedings of the International Conference on Nanotechnology - Research and Commercialization (ICONT) 2011 American Institute of Physics
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Biosensor
CMOS process
E-beam lithography
Nanowires
Silicon
spellingShingle Biosensor
CMOS process
E-beam lithography
Nanowires
Silicon
Uda, Hashim, Prof. Dr.
Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization
description Link to publisher's homepage at http://www.aip.org/
author2 uda@unimap.edu.my
author_facet uda@unimap.edu.my
Uda, Hashim, Prof. Dr.
format Working Paper
author Uda, Hashim, Prof. Dr.
author_sort Uda, Hashim, Prof. Dr.
title Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization
title_short Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization
title_full Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization
title_fullStr Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization
title_full_unstemmed Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization
title_sort silicon nanowire sensor by mix and match lithography process: fabrication and characterization
publisher American Institute of Physics
publishDate 2013
url http://dspace.unimap.edu.my/xmlui/handle/123456789/26633
_version_ 1643803349298970624
score 13.222552

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