Silica microchannel fabrication using fluorine based rie with alas a mask

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Main Authors: Wan Mokhzani, Wan Norhaimi, Retnasamy, Vithyacharan, Zaliman, Sauli, Assoc. Prof. Dr., Taniselass, Steven, Ahmad Husni, Mohd Shapri, Norazeani, Abdul Rahman, Abdul Halis, Abdul Aziz
Other Authors: wanmokhdzani@unimap.edu.my
Format: Article
Language:English
Published: INSInet Publications 2013
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Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/26628
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spelling my.unimap-266282013-07-13T04:03:16Z Silica microchannel fabrication using fluorine based rie with alas a mask Wan Mokhzani, Wan Norhaimi Retnasamy, Vithyacharan Zaliman, Sauli, Assoc. Prof. Dr. Taniselass, Steven Ahmad Husni, Mohd Shapri Norazeani, Abdul Rahman Abdul Halis, Abdul Aziz wanmokhdzani@unimap.edu.my Reactive Ion Etching Process (RIE) Silica microchannel Fabrication process Microfluidics Link to publisher's homepage at www.aensiweb.com/‎ The silica microchannel fabrication process has been executed with Al thin films as the sacrificial layer during Reactive Ion Etching Process (RIE). CF4/Ar and SF6/Ar plasmas has been used to investigate etch rate of Al thin films and silica wafer. Energy Dispersive X-ray (EDX) analysis has been used to investigate the chemical residues on the surface of silica wafer after RIE process. The transparency of the silica waveguide has also been inspected based on fringe visibility with the aid of the Twyman-Green Interferometer (TGI) for interferometry measurements. The results demonstrate that CF4/Ar plasma etches silica faster than SF6/Ar plasma while keeping the etching rate of Al minimal. Residues are also less visible on the surface of the microchannel when applying CF4/Ar plasma. 2013-07-13T04:03:16Z 2013-07-13T04:03:16Z 2012-09 Article Australian Journal of Basic and Applied Sciences, vol. 6(9), 2012, pages 732-737 1991-8178 http://www.ajbasweb.com/ajbas/2012/Sep%202012/732-737.pdf http://hdl.handle.net/123456789/26628 en INSInet Publications
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Reactive Ion Etching Process (RIE)
Silica microchannel
Fabrication process
Microfluidics
spellingShingle Reactive Ion Etching Process (RIE)
Silica microchannel
Fabrication process
Microfluidics
Wan Mokhzani, Wan Norhaimi
Retnasamy, Vithyacharan
Zaliman, Sauli, Assoc. Prof. Dr.
Taniselass, Steven
Ahmad Husni, Mohd Shapri
Norazeani, Abdul Rahman
Abdul Halis, Abdul Aziz
Silica microchannel fabrication using fluorine based rie with alas a mask
description Link to publisher's homepage at www.aensiweb.com/‎
author2 wanmokhdzani@unimap.edu.my
author_facet wanmokhdzani@unimap.edu.my
Wan Mokhzani, Wan Norhaimi
Retnasamy, Vithyacharan
Zaliman, Sauli, Assoc. Prof. Dr.
Taniselass, Steven
Ahmad Husni, Mohd Shapri
Norazeani, Abdul Rahman
Abdul Halis, Abdul Aziz
format Article
author Wan Mokhzani, Wan Norhaimi
Retnasamy, Vithyacharan
Zaliman, Sauli, Assoc. Prof. Dr.
Taniselass, Steven
Ahmad Husni, Mohd Shapri
Norazeani, Abdul Rahman
Abdul Halis, Abdul Aziz
author_sort Wan Mokhzani, Wan Norhaimi
title Silica microchannel fabrication using fluorine based rie with alas a mask
title_short Silica microchannel fabrication using fluorine based rie with alas a mask
title_full Silica microchannel fabrication using fluorine based rie with alas a mask
title_fullStr Silica microchannel fabrication using fluorine based rie with alas a mask
title_full_unstemmed Silica microchannel fabrication using fluorine based rie with alas a mask
title_sort silica microchannel fabrication using fluorine based rie with alas a mask
publisher INSInet Publications
publishDate 2013
url http://dspace.unimap.edu.my/xmlui/handle/123456789/26628
_version_ 1643795006209654784
score 13.214268