Application of e-beam lithography for nanowire development

• المؤلفون الرئيسيون: S. Fatimah, Abd Rahman, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor
• مؤلفون آخرون: [e-mail]
• التنسيق: Working Paper
• اللغة: English
• منشور في: Universiti Malaysia Perlis (UniMAP) 2012
• الموضوعات: Semiconductor device; Electron beam lithography (EBL); Photolithography; Nanowires
• الوصول للمادة أونلاين: http://dspace.unimap.edu.my/xmlui/handle/123456789/21642

International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia.