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Application of e-beam lithography for nanowire development

International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia.

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Bibliographic Details
Main Authors: S. Fatimah, Abd Rahman, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor
Other Authors: aeiou_0410@yahoo.co.uk
Format: Working Paper
Language:English
Published: Universiti Malaysia Perlis (UniMAP) 2012
Subjects:
Semiconductor device
Electron beam lithography (EBL)
Photolithography
Nanowires
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/21642
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spelling my.unimap-216422012-11-06T09:53:28Z Application of e-beam lithography for nanowire development S. Fatimah, Abd Rahman Uda, Hashim, Prof. Dr. Mohammad Nuzaihan, Md Nor aeiou_0410@yahoo.co.uk Semiconductor device Electron beam lithography (EBL) Photolithography Nanowires International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia. Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly insufficient. In this paper, the recent development of the silicon nanowire based on electron beam lithography technique is reviewed. EBL technology is a best tool to fabricate patterns having nanometer feature sizes. In this project, the exposure process was carried out by an in-house modified electron beam writing system using JOEL JSM 6460LA SEM integrated with ELPHY Quantum pattern generator. Following an introduction of this technique, the software description, pattern design formation and resist development are separately examined and discussed. 2012-11-06T09:53:28Z 2012-11-06T09:53:28Z 2010-10-16 Working Paper 978-967-5760-03-7 http://hdl.handle.net/123456789/21642 en Proceedings of the International Postgraduate Conference on Engineering (IPCE 2010) Universiti Malaysia Perlis (UniMAP) Centre for Graduate Studies
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Semiconductor device
Electron beam lithography (EBL)
Photolithography
Nanowires
spellingShingle Semiconductor device
Electron beam lithography (EBL)
Photolithography
Nanowires
S. Fatimah, Abd Rahman
Uda, Hashim, Prof. Dr.
Mohammad Nuzaihan, Md Nor
Application of e-beam lithography for nanowire development
description International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia.
author2 aeiou_0410@yahoo.co.uk
author_facet aeiou_0410@yahoo.co.uk
S. Fatimah, Abd Rahman
Uda, Hashim, Prof. Dr.
Mohammad Nuzaihan, Md Nor
format Working Paper
author S. Fatimah, Abd Rahman
Uda, Hashim, Prof. Dr.
Mohammad Nuzaihan, Md Nor
author_sort S. Fatimah, Abd Rahman
title Application of e-beam lithography for nanowire development
title_short Application of e-beam lithography for nanowire development
title_full Application of e-beam lithography for nanowire development
title_fullStr Application of e-beam lithography for nanowire development
title_full_unstemmed Application of e-beam lithography for nanowire development
title_sort application of e-beam lithography for nanowire development
publisher Universiti Malaysia Perlis (UniMAP)
publishDate 2012
url http://dspace.unimap.edu.my/xmlui/handle/123456789/21642
_version_ 1643793449030254592
score 13.214268

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