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Application of e-beam lithography for nanowire development

International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia.

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Bibliographic Details
Main Authors: S. Fatimah, Abd Rahman, Uda, Hashim, Prof. Dr., Mohammad Nuzaihan, Md Nor
Other Authors: aeiou_0410@yahoo.co.uk
Format: Working Paper
Language:English
Published: Universiti Malaysia Perlis (UniMAP) 2012
Subjects:
Semiconductor device
Electron beam lithography (EBL)
Photolithography
Nanowires
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/21642
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Summary:International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia.

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