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Fabrication and characterization of 50 nm silicon nano-gap structures

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Main Authors: T.S, Dhahi, Uda, Hashim, Prof. Dr., N.M., Ahmed
Format: Article
Language:English
Published: American Scientific Publishers 2011
Subjects:
Nano-gap
Nanostructure
Optical characterization
Pattern-size reduction
Photolithography
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/13290
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spelling my.unimap-132902013-11-20T03:58:10Z Fabrication and characterization of 50 nm silicon nano-gap structures T.S, Dhahi Uda, Hashim, Prof. Dr. N.M., Ahmed Nano-gap Nanostructure Optical characterization Pattern-size reduction Photolithography Link to publisher's homepage at www.aspbs.com A simple method for the fabrication of nano-gaps less than 50 nm by using conventional photolithography combined with patterned-size reduction techniques is presented. Silicon material is used to fabricate the nano-gap structure and gold is used for the electrode. Two chrome masks are proposed to complete this work, the first mask for the nano-gap pattern and a second mask for the electrode. The method is based on the control of the coefficients (temperature and time) with an improved pattern size resolution by thermal oxidation. With this technique, there are no principal limitations to fabricating nanostructures with different layouts down to several nanometers in dimension. In this work, the proposed method is experimentally demonstrated by preparing the nano-gaps on a Si-SiO2 substrate down to dimensions of 50 nm. The optical characterization that is applied to check the nano-gap structure is by using the scanning electron microscope (SEM). 2011-07-21T09:29:01Z 2011-07-21T09:29:01Z 2011-04 Article Science of Advanced Materials, Vol. 3(2), 2011, pages 233-238 1947-2935 http://www.ingentaconnect.com/content/asp/sam/2011/00000003/00000002/art00008 http://hdl.handle.net/123456789/13290 en American Scientific Publishers
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Nano-gap
Nanostructure
Optical characterization
Pattern-size reduction
Photolithography
spellingShingle Nano-gap
Nanostructure
Optical characterization
Pattern-size reduction
Photolithography
T.S, Dhahi
Uda, Hashim, Prof. Dr.
N.M., Ahmed
Fabrication and characterization of 50 nm silicon nano-gap structures
description Link to publisher's homepage at www.aspbs.com
format Article
author T.S, Dhahi
Uda, Hashim, Prof. Dr.
N.M., Ahmed
author_facet T.S, Dhahi
Uda, Hashim, Prof. Dr.
N.M., Ahmed
author_sort T.S, Dhahi
title Fabrication and characterization of 50 nm silicon nano-gap structures
title_short Fabrication and characterization of 50 nm silicon nano-gap structures
title_full Fabrication and characterization of 50 nm silicon nano-gap structures
title_fullStr Fabrication and characterization of 50 nm silicon nano-gap structures
title_full_unstemmed Fabrication and characterization of 50 nm silicon nano-gap structures
title_sort fabrication and characterization of 50 nm silicon nano-gap structures
publisher American Scientific Publishers
publishDate 2011
url http://dspace.unimap.edu.my/xmlui/handle/123456789/13290
_version_ 1643790811329986560
score 13.214268

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