Design, fabrication and characterization of CMOS ISFET for pH measurements

The Ion Sensitive Field Effect Transistor (ISFET) is a potentiometric pH sensor that is easily adapted to a wide range of chemical, biochemical and biomedical applications. The operation of an ISFET is based on the surface adsorption of charges from the test solution in the solid-electrolyte inte...

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Main Author: Chin, Seng Fatt
Format: Thesis
Language:English
Published: Universiti Malaysia Perlis 2011
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Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/12919
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spelling my.unimap-129192011-07-01T07:14:53Z Design, fabrication and characterization of CMOS ISFET for pH measurements Chin, Seng Fatt Ion Sensitive Field Effect Transistor (ISFET) Potential Hydrogen (pH) pH sensitivity CMOS ISFET Simulation CMOS technology CMOS The Ion Sensitive Field Effect Transistor (ISFET) is a potentiometric pH sensor that is easily adapted to a wide range of chemical, biochemical and biomedical applications. The operation of an ISFET is based on the surface adsorption of charges from the test solution in the solid-electrolyte interface that is part of the gate of the ISFET. As a result of this process, the threshold voltage of the ISFET is modulated.This thesis describes the design, simulation, fabrication and characterization of ISFET for pH measurement of an aqueous solution. Prior to fabrication, the ISFET is simulated via TCAD TSUPREM4 process and MEDICI device simulator. The ISFET is fabricated in-house in the Micro Fabrication Cleanroom Laboratory (MFCL) at Universiti of Malaysia Perlis (UniMAP) by using CMOS fabrication technology. This goal is achieved due to the compatibility of ISFET and CMOS. Silicon nitride was used as an ion sensitive membrane and it was deposited by using Plasma Enhanced Chemical Vapour Deposition (PECVD) technique. A total of six masks were used in this fabrication to create the CMOS ISFET. The ISFET fabricated is aimed at pH measurement of aqueous solution. In order to obtain an accurate characterization of the ISFET, a semiconductor characterization system (SCS) comprises of a micro probe station and a parameter analyzer was utilized. For the analysis of ISFET in test solution, an Ag/AgCl electrode is used as a reference electrode and three types of standard aqueous pH buffer solutions of pH 4, pH 7 and pH 10 were used during the experiment of ISFET analysis. The sensitivity of the ISFETs measured is 40mV/pH for n-channel ISFET and 30mV/pH for p-channel ISFET. These results demonstrate that the in-house fabricated CMOS ISFET is functional as expected. 2011-07-01T07:14:53Z 2011-07-01T07:14:53Z 2009 Thesis http://hdl.handle.net/123456789/12919 en Universiti Malaysia Perlis School of Microelectronic Engineering
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Ion Sensitive Field Effect Transistor (ISFET)
Potential Hydrogen (pH)
pH sensitivity
CMOS ISFET
Simulation
CMOS technology
CMOS
spellingShingle Ion Sensitive Field Effect Transistor (ISFET)
Potential Hydrogen (pH)
pH sensitivity
CMOS ISFET
Simulation
CMOS technology
CMOS
Chin, Seng Fatt
Design, fabrication and characterization of CMOS ISFET for pH measurements
description The Ion Sensitive Field Effect Transistor (ISFET) is a potentiometric pH sensor that is easily adapted to a wide range of chemical, biochemical and biomedical applications. The operation of an ISFET is based on the surface adsorption of charges from the test solution in the solid-electrolyte interface that is part of the gate of the ISFET. As a result of this process, the threshold voltage of the ISFET is modulated.This thesis describes the design, simulation, fabrication and characterization of ISFET for pH measurement of an aqueous solution. Prior to fabrication, the ISFET is simulated via TCAD TSUPREM4 process and MEDICI device simulator. The ISFET is fabricated in-house in the Micro Fabrication Cleanroom Laboratory (MFCL) at Universiti of Malaysia Perlis (UniMAP) by using CMOS fabrication technology. This goal is achieved due to the compatibility of ISFET and CMOS. Silicon nitride was used as an ion sensitive membrane and it was deposited by using Plasma Enhanced Chemical Vapour Deposition (PECVD) technique. A total of six masks were used in this fabrication to create the CMOS ISFET. The ISFET fabricated is aimed at pH measurement of aqueous solution. In order to obtain an accurate characterization of the ISFET, a semiconductor characterization system (SCS) comprises of a micro probe station and a parameter analyzer was utilized. For the analysis of ISFET in test solution, an Ag/AgCl electrode is used as a reference electrode and three types of standard aqueous pH buffer solutions of pH 4, pH 7 and pH 10 were used during the experiment of ISFET analysis. The sensitivity of the ISFETs measured is 40mV/pH for n-channel ISFET and 30mV/pH for p-channel ISFET. These results demonstrate that the in-house fabricated CMOS ISFET is functional as expected.
format Thesis
author Chin, Seng Fatt
author_facet Chin, Seng Fatt
author_sort Chin, Seng Fatt
title Design, fabrication and characterization of CMOS ISFET for pH measurements
title_short Design, fabrication and characterization of CMOS ISFET for pH measurements
title_full Design, fabrication and characterization of CMOS ISFET for pH measurements
title_fullStr Design, fabrication and characterization of CMOS ISFET for pH measurements
title_full_unstemmed Design, fabrication and characterization of CMOS ISFET for pH measurements
title_sort design, fabrication and characterization of cmos isfet for ph measurements
publisher Universiti Malaysia Perlis
publishDate 2011
url http://dspace.unimap.edu.my/xmlui/handle/123456789/12919
_version_ 1643790699106140160
score 13.223943