Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst

• Main Authors: Ng, Kim Hoong, Cheng, C. K.
• Format: Article
• Language: English; English
• Published: Elsevier 2016
• Subjects: TP Chemical technology
• Online Access: http://umpir.ump.edu.my/id/eprint/12990/1/UMP-IR-Chem-Eng%20J.pdf; http://umpir.ump.edu.my/id/eprint/12990/7/Photo-polishing%20of%20POME%20into%20CH4-lean%20biogas%20over%20the%20UV-responsive%20ZnO%20photocatalyst.pdf; http://umpir.ump.edu.my/id/eprint/12990/; http://dx.doi.org/10.1016/j.cej.2016.04.105

We report here the photo-polishing of POME with a concomitant production of CH4-lean biogas over UV/ZnO photocatalysis system. The photoreaction results showed that the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal after just 240 min of UV irradiation...