Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst

We report here the photo-polishing of POME with a concomitant production of CH4-lean biogas over UV/ZnO photocatalysis system. The photoreaction results showed that the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal after just 240 min of UV irradiation...

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Main Authors: Ng, Kim Hoong, Cheng, C. K.
Format: Article
Language:English
English
Published: Elsevier 2016
Subjects:
Online Access:http://umpir.ump.edu.my/id/eprint/12990/1/UMP-IR-Chem-Eng%20J.pdf
http://umpir.ump.edu.my/id/eprint/12990/7/Photo-polishing%20of%20POME%20into%20CH4-lean%20biogas%20over%20the%20UV-responsive%20ZnO%20photocatalyst.pdf
http://umpir.ump.edu.my/id/eprint/12990/
http://dx.doi.org/10.1016/j.cej.2016.04.105
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spelling my.ump.umpir.129902018-01-10T06:59:06Z http://umpir.ump.edu.my/id/eprint/12990/ Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst Ng, Kim Hoong Cheng, C. K. TP Chemical technology We report here the photo-polishing of POME with a concomitant production of CH4-lean biogas over UV/ZnO photocatalysis system. The photoreaction results showed that the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal after just 240 min of UV irradiation. It is found that all the photomineralization kinetics can be modelled to the 1st-order reaction order, with specific reaction rates (k)ranging from 1.022 × 10-3 to 3.118 × 10-3 min-1. The highest amount of gaseous products, viz. 36,172 µmol of CO2and 333 µmol of CH4, were produced at this optimum loading. Significantly, the organic removal efficiency was further enhanced when the UV exposure was prolonged to 22 h, attaining final readings of 44 ppm, 26 ppm and 20 mg/L, respectively, for chemical oxygen demand (COD), biochemical oxygen demand (BOD) and oil and grease (O&G). Furthermore, our scavenging study suggests that the photomineralization of organic pollutants in the POME occurred via attack by the highly reactive OH• radical. In addition, we posit that the reaction took place on the surface of ZnO2 upon the adsorption of the organic pollutants. Our proposition was further confirmed by the presence of carbonaceous species on the surface of ZnO through a combination of spectroscopic probes, i.e. FTIR, SEM-EDX, as well as the deterioration in the BET specific surface area for the used ZnO photocatalyst. The plunge of ZnO’s photodegradation performance was observed in the recyclability test. The performance has plummeted from 50% to 35% in second cycle before stabilizing at 38% in the third cycle. This can be attributed to the blockage of surface area of ZnO by the deposited organic species. Elsevier 2016-04-23 Article PeerReviewed application/pdf en http://umpir.ump.edu.my/id/eprint/12990/1/UMP-IR-Chem-Eng%20J.pdf application/pdf en http://umpir.ump.edu.my/id/eprint/12990/7/Photo-polishing%20of%20POME%20into%20CH4-lean%20biogas%20over%20the%20UV-responsive%20ZnO%20photocatalyst.pdf Ng, Kim Hoong and Cheng, C. K. (2016) Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst. Chemical Engineering Journal. ISSN 1385-8947 (In Press) http://dx.doi.org/10.1016/j.cej.2016.04.105
institution Universiti Malaysia Pahang
building UMP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Pahang
content_source UMP Institutional Repository
url_provider http://umpir.ump.edu.my/
language English
English
topic TP Chemical technology
spellingShingle TP Chemical technology
Ng, Kim Hoong
Cheng, C. K.
Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
description We report here the photo-polishing of POME with a concomitant production of CH4-lean biogas over UV/ZnO photocatalysis system. The photoreaction results showed that the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal after just 240 min of UV irradiation. It is found that all the photomineralization kinetics can be modelled to the 1st-order reaction order, with specific reaction rates (k)ranging from 1.022 × 10-3 to 3.118 × 10-3 min-1. The highest amount of gaseous products, viz. 36,172 µmol of CO2and 333 µmol of CH4, were produced at this optimum loading. Significantly, the organic removal efficiency was further enhanced when the UV exposure was prolonged to 22 h, attaining final readings of 44 ppm, 26 ppm and 20 mg/L, respectively, for chemical oxygen demand (COD), biochemical oxygen demand (BOD) and oil and grease (O&G). Furthermore, our scavenging study suggests that the photomineralization of organic pollutants in the POME occurred via attack by the highly reactive OH• radical. In addition, we posit that the reaction took place on the surface of ZnO2 upon the adsorption of the organic pollutants. Our proposition was further confirmed by the presence of carbonaceous species on the surface of ZnO through a combination of spectroscopic probes, i.e. FTIR, SEM-EDX, as well as the deterioration in the BET specific surface area for the used ZnO photocatalyst. The plunge of ZnO’s photodegradation performance was observed in the recyclability test. The performance has plummeted from 50% to 35% in second cycle before stabilizing at 38% in the third cycle. This can be attributed to the blockage of surface area of ZnO by the deposited organic species.
format Article
author Ng, Kim Hoong
Cheng, C. K.
author_facet Ng, Kim Hoong
Cheng, C. K.
author_sort Ng, Kim Hoong
title Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
title_short Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
title_full Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
title_fullStr Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
title_full_unstemmed Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
title_sort photo-polishing of pome into ch4-lean biogas over the uv-responsive zno photocatalyst
publisher Elsevier
publishDate 2016
url http://umpir.ump.edu.my/id/eprint/12990/1/UMP-IR-Chem-Eng%20J.pdf
http://umpir.ump.edu.my/id/eprint/12990/7/Photo-polishing%20of%20POME%20into%20CH4-lean%20biogas%20over%20the%20UV-responsive%20ZnO%20photocatalyst.pdf
http://umpir.ump.edu.my/id/eprint/12990/
http://dx.doi.org/10.1016/j.cej.2016.04.105
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score 13.211869