Properties of a-C:H films deposited in CH4 H2 and CH4he DC plasma

Hydrogenated amorphous carbon (a-C:H) films were deposited using direct-current plasma enhanced chemical vapor deposition (DC PECVD) process. The resulting film properties were studied with respect to the introduction of hydrogen (H2) and helium (He) in methane (CH4) plasma. The analysis techniques...

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Bibliographic Details
Main Authors: Awang, R., Rahman, S.A.
Format: Article
Published: 2009
Subjects:
Online Access:http://eprints.um.edu.my/7374/
http://www.worldscientific.com/doi/abs/10.1142/S0219581X09005566?journalCode=ijn
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