Photoconductivity in pulsed PECVD hydrogenated amorphous silicon thin films
Hydrogenated Amorphous Silicon (a-Si:H) thin films were deposited using a pulsed plasma enhanced chemical vapor deposition (PECVD) system developed in our laboratory. The pulsed discharge has been shown to allow deposition at higher power without deteriorating the film properties. In this work, we r...
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my.um.eprints.73702013-07-16T01:06:59Z http://eprints.um.edu.my/7370/ Photoconductivity in pulsed PECVD hydrogenated amorphous silicon thin films Tong, Goh Boon Han, Shi Chee Richard, Ritikos Rasat, Muhamat Muhamad Abdul, Rahman Saadah QC Physics Hydrogenated Amorphous Silicon (a-Si:H) thin films were deposited using a pulsed plasma enhanced chemical vapor deposition (PECVD) system developed in our laboratory. The pulsed discharge has been shown to allow deposition at higher power without deteriorating the film properties. In this work, we report our work on the photoconductivity studies done on this pulsed PECVD a-Si:H films. Photoconductivity in these films showed strong dependence on the discharge power and silane flow-rate. Optical parameters obtained from the optical transmission spectra in the ultra-violet visible region of these films were analyzed together with the photoconductivity results. This analysis was used to explain the effects of discharge power on the photoconductivity of the pulsed PECVD a-SiH thin film. 2006 Article PeerReviewed Tong, Goh Boon and Han, Shi Chee and Richard, Ritikos and Rasat, Muhamat Muhamad and Abdul, Rahman Saadah (2006) Photoconductivity in pulsed PECVD hydrogenated amorphous silicon thin films. Jurnal Fizik Malaysia, 27 (3 & 4). pp. 121-123. ISSN 0128-0333 |
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QC Physics Tong, Goh Boon Han, Shi Chee Richard, Ritikos Rasat, Muhamat Muhamad Abdul, Rahman Saadah Photoconductivity in pulsed PECVD hydrogenated amorphous silicon thin films |
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Hydrogenated Amorphous Silicon (a-Si:H) thin films were deposited using a pulsed plasma enhanced chemical vapor deposition (PECVD) system developed in our laboratory. The pulsed discharge has been shown to allow deposition at higher power without deteriorating the film properties. In this work, we report our work on the photoconductivity studies done on this pulsed PECVD a-Si:H films. Photoconductivity in these films showed strong dependence on the discharge power and silane flow-rate. Optical parameters obtained from the optical transmission spectra in the ultra-violet visible region of these films were analyzed together with the photoconductivity results. This analysis was used to explain the effects of discharge power on the photoconductivity of the pulsed PECVD a-SiH thin film. |
format |
Article |
author |
Tong, Goh Boon Han, Shi Chee Richard, Ritikos Rasat, Muhamat Muhamad Abdul, Rahman Saadah |
author_facet |
Tong, Goh Boon Han, Shi Chee Richard, Ritikos Rasat, Muhamat Muhamad Abdul, Rahman Saadah |
author_sort |
Tong, Goh Boon |
title |
Photoconductivity in pulsed PECVD hydrogenated amorphous silicon thin films |
title_short |
Photoconductivity in pulsed PECVD hydrogenated amorphous silicon thin films |
title_full |
Photoconductivity in pulsed PECVD hydrogenated amorphous silicon thin films |
title_fullStr |
Photoconductivity in pulsed PECVD hydrogenated amorphous silicon thin films |
title_full_unstemmed |
Photoconductivity in pulsed PECVD hydrogenated amorphous silicon thin films |
title_sort |
photoconductivity in pulsed pecvd hydrogenated amorphous silicon thin films |
publishDate |
2006 |
url |
http://eprints.um.edu.my/7370/ |
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1643688027554316288 |
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13.214268 |