Optical properties of annealed Si:H thin film prepared by layer-by-layer (LBL) deposition technique

• المؤلفون الرئيسيون: Goh, Boon Tong, Muhamad, Muhamad Rasat, Rahman, Saadah Abdul
• التنسيق: مقال
• منشور في: Elsevier 2010
• الموضوعات: QC Physics
• الوصول للمادة أونلاين: http://eprints.um.edu.my/7369/; https://doi.org/10.1016/j.physb.2010.09.015

Optical studies were performed on annealed hydrogenated silicon (Si:H) thin films deposited by plasma-enhanced chemical vapor deposition (PECVD) using the layer-by-layer (LBL) deposition technique. The films were annealed for 1 h at temperatures of 400, 600, 800 and 1000 degrees C in ambient nitroge...