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Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition

A plasma enhanced chemical vapour deposition (PECVD) system was designed and built in-house for the deposition of nanocrystalline silicon thin films. In this work, nanocrystalline slicon thin films were deposited at different rf(radio-frequency) power with the silane to hydrogen partial pressure rat...

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Main Authors: Han, S.C., Tong, G.B., Richard, R., Meriam Ab, G.S., Rasat, M.M., Rahman, S.A.
Format: Article
Published: 2006
Subjects:
QC Physics
Online Access:http://eprints.um.edu.my/7365/
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spelling my.um.eprints.73652013-09-23T02:16:41Z http://eprints.um.edu.my/7365/ Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition Han, S.C. Tong, G.B. Richard, R. Meriam Ab, G.S. Rasat, M.M. Rahman, S.A. QC Physics A plasma enhanced chemical vapour deposition (PECVD) system was designed and built in-house for the deposition of nanocrystalline silicon thin films. In this work, nanocrystalline slicon thin films were deposited at different rf(radio-frequency) power with the silane to hydrogen partial pressure ratio fixed. X-ray diffraction (XRD) and Raman spectroscopy measurements were done to investigate the structural properties of the films. Optical transmittance measurements were carried out to determine various optical parameters of these films. The rf power showed strong influence on the structural and optical properties of the nanocrystalline silicon films produced. 2006 Article PeerReviewed Han, S.C. and Tong, G.B. and Richard, R. and Meriam Ab, G.S. and Rasat, M.M. and Rahman, S.A. (2006) Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition. Jurnal Fizik Malaysia, 27 (3 & 4). pp. 125-127. ISSN 0128-0333
institution Universiti Malaya
building UM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaya
content_source UM Research Repository
url_provider http://eprints.um.edu.my/
topic QC Physics
spellingShingle QC Physics
Han, S.C.
Tong, G.B.
Richard, R.
Meriam Ab, G.S.
Rasat, M.M.
Rahman, S.A.
Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition
description A plasma enhanced chemical vapour deposition (PECVD) system was designed and built in-house for the deposition of nanocrystalline silicon thin films. In this work, nanocrystalline slicon thin films were deposited at different rf(radio-frequency) power with the silane to hydrogen partial pressure ratio fixed. X-ray diffraction (XRD) and Raman spectroscopy measurements were done to investigate the structural properties of the films. Optical transmittance measurements were carried out to determine various optical parameters of these films. The rf power showed strong influence on the structural and optical properties of the nanocrystalline silicon films produced.
format Article
author Han, S.C.
Tong, G.B.
Richard, R.
Meriam Ab, G.S.
Rasat, M.M.
Rahman, S.A.
author_facet Han, S.C.
Tong, G.B.
Richard, R.
Meriam Ab, G.S.
Rasat, M.M.
Rahman, S.A.
author_sort Han, S.C.
title Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition
title_short Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition
title_full Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition
title_fullStr Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition
title_full_unstemmed Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition
title_sort nanocrystalline silicon thin films by rf plasma enhanced chemical vapour deposition
publishDate 2006
url http://eprints.um.edu.my/7365/
_version_ 1643688025919586304
score 13.160551

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