Multi-phase structured silicon carbon nitride thin films prepared by hot-wire chemical vapour deposition

• Main Authors: Badaruddin, M.R., Muhamad, M.R., Rahman, S.A.
• Format: Article
• Published: 2011
• Subjects: QC Physics
• Online Access: http://eprints.um.edu.my/7364/

In this work, Silicon Carbon Nitride (Si-C-N) thin films were deposited by Hot Wire Chemical Vapour Deposition (HWCVD) technique from a gas mixture of silane (SiH4), methane (CH4) and nitrogen (N-2). Six sets of Si-C-N thin films were produced and studied. The component gas flow rate ratio (SiH4:CH4...